The invention provides a reaction chamber and semiconductor processing equipment. The reaction chamber includes a faraday shield ring made of non-magnetic material and an insulating ring made of insulating material. A slotting is disposed in the faraday shield ring. The faraday shield ring and the insulating ring are both disposed on the inner side of the side wall of the reaction chamber, and the faraday shield ring is stacked on the insulating ring. The inner side of the inner circumferential wall of the insulating ring is provided with a shield ring. The shield ring is connected with an edge region of the lower surface of the faraday shield ring. A slotting is disposed in the shield ring, and the shield ring is made of non-magnetic material. The outer circumferential wall of the shield ring and the inner circumferential wall of the insulating ring have horizontal spacing in a horizontal direction. The reaction chamber can be used for reducing the ignition risk, and pollution of metal particle flaking to the reaction chamber can also be reduced. In addition, the inner diameter and usable space of the reaction chamber can be enlarged.