The invention provides an air inlet device and semiconductor processing equipment. The air inlet device is used for conveying process gas into a reaction chamber and comprises a device body and one or a plurality of air inlet pipe(s), wherein a main air inlet passage which does not pass through the lower surface of the device body is arranged in the device body and communicateswith a process air source; an air inlet end of each air inlet pipe communicates with the main air inlet passage after passing through the side wall of the device body; each air inlet pipe extends towards the outer side of the side wall of the device body and an air outlet end of each air inlet pipe is far away from the device body so that the process gas provided by the process gas source is conveyed into the reaction chamber from the main air inlet passage and the air inlet pipes. According to the air inlet device and the semiconductor processing equipment provided by the invention, the problem of non-uniform gas distribution in the reaction chamber can be solved, thus the process uniformity and the process quality of a substrate can be improved.