There are provided a liquid processing method, a liquid processing apparatus and a recording medium for liquid processing which can enhance the uniformity of the coating state of a processing liquid on a substrate. A coating unit (U1) includes a rotary holder (20) for rotating a wafer (W), a nozzle (32) for supplying a processing liquid (R) onto a surface (Wa) of the wafer (W), and a controller (60) for controlling the position of the nozzle (32) with respect to the wafer (W). A liquid processing method includes: starting the supply of the processing liquid (R) to the surface (Wa) of the wafer (W) at an eccentric position at a distance from the center (CL1) of rotation of the wafer (W), and moving the position on the wafer (W) to which the processing liquid (R) is supplied toward the center (CL1) of rotation of the wafer (W) while rotating the wafer (W) at a first rotational speed ([omega]1); and, after the processing liquid supply position has reached the center (CL1) of rotation of the wafer (W), rotating the wafer (W) at a second rotational speed ([omega]2) which is higher than the first rotational speed ([omega]1), thereby allowing the processing liquid (R) to spread toward the periphery of the wafer (W).