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发明授权
CN106935546B 阵列基板的制备方法、阵列基板、显示面板和显示装置 有权

阵列基板的制备方法、阵列基板、显示面板和显示装置
摘要：
本发明公开了一种阵列基板的制备方法、阵列基板、显示面板和显示装置，用以减少显示装置多个亮点和暗点的发生。制备方法包括提供一衬底基板，在衬底基板上形成有源层，在有源层朝向衬底基板或背离衬底基板的一侧形成栅极层，在有源层背离衬底基板的一侧形成层间介质层，沿远离衬底基板方向形成的层间介质层包括第一膜层、第二膜层、第三膜层、第四膜层，第一膜层和第三膜层包括氧化硅层，第二膜层和第四膜层包括氮化硅层；形成位于层间介质层上的光刻胶层；形成从层间介质层延伸至有源层的过孔；形成位于层间介质层背离衬底基板一侧的源、漏极层，在形成源、漏极层的同时去除层间介质层中未被源、漏极层覆盖的部分内的第四膜层。
摘要（英）：

A method for manufacturing an array substrate, an array substrate, a display panel, and a display device. The manufacturing method comprises: forming an active layer (2) on a base substrate (1), and forming a gate layer (7) on a side, facing the base substrate (1) or facing away from the base substrate (1), of the active layer (2); forming an interlayer dielectric layer (3) on a side, facing away from the base substrate (1), of the active layer (2), wherein the interlayer dielectric layer (3) comprises a first film layer (31), a second film layer (32), a third film layer (33) and a fourth film layer (34) that are successively stacked in a direction away from the base substrate (1); forming a photoresist layer (4) on the interlayer dielectric layer (3); forming a through hole (5) extending from the interlayer dielectric layer (3) to the active layer (2); and forming a source/drain layer (6) on a side, facing away from the base substrate (1), of the interlayer dielectric layer (3), wherein the fourth film layer (34) in the portion of the interlayer dielectric layer (3) not covered by the source/drain layer (6) is removed when the source/drain layer (6) is formed.

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