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发明公开
CN108074840A 基板处理装置、基板处理方法以及存储介质 审中-实审

基板处理装置、基板处理方法以及存储介质
摘要：
本发明提供一种使用超临界状态的处理流体来对基板进行处理的基板处理装置、基板处理方法以及存储介质，在该基板处理装置中，使过滤器的过滤性能充分发挥，降低处理后的基板的微粒水平。基板处理装置具备：处理容器(301)；以及供给线(50)，其将送出超临界状态的处理流体的流体供给源(51)和处理容器相连接。在供给线上设置有第一开闭阀(52a)，在该供给线的下游侧设置有第一节流部(55a)，在处理容器内的压力为处理流体的临界压力以下的期间，该第一节流部(55a)使在供给线中流动的超临界状态的处理流体变化为气体状态，在该供给线的更下游侧设置有第一过滤器(57)。
摘要（英）：

The present invention provides a substrate processing apparatus, a substrate processing method, and a storage medium that process a substrate using a supercritical-state processing fluid. In the substrate processing apparatus, the filter performance of the filter is sufficiently exhibited, thereby reducing the post-treatment substrate particle level. The substrate processing apparatus includes a processing container (301) and a supply line (50) for connecting a fluid supply source (51) (used for sending a supercritical fluid) with the processing container. A first on-off valve (52a) is provided on the supply line, a first throttle portion (55a) is provided on the downstream side of the supply line, and the pressure in the processing container is equal to or less than the critical pressureof the processing fluid. The first throttle portion (55a) changes the supercritical-state processing fluid flowing in the supply line to a gas state, and a first filter (57) is provided further downstream of the supply line.

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