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发明公开
CN108695209A 基板处理装置、基板处理方法以及存储介质 有权

基板处理装置、基板处理方法以及存储介质
摘要：
本发明提供一种能够抑制伴随含金属覆膜的利用而产生的金属污染的基板处理装置、基板处理方法以及存储介质。涂布/显影装置具备第一保护处理部、成膜部、第一清洗处理部以及控制部。控制部构成为执行以下控制：控制第一保护处理部，使之在晶圆的周缘部形成第一保护膜；控制成膜部，使之在晶圆的表面形成抗蚀膜；控制第一清洗处理部，使之向晶圆的周缘部供给用于去除抗蚀膜的第一清洗液；控制第一清洗处理部，使之向该周缘部供给用于去除金属成分的第二清洗液；以及控制第一清洗处理部，使之向该周缘部供给用于去除第一保护膜的第三清洗液。
摘要（英）：

The present invention provides a substrate processing apparatus, a substrate processing method, and a storage medium capable of suppressing metal contamination accompanying use of a metal-containing coating. A coating and developing apparatus includes a first protection processing unit, a film forming unit, a first cleaning processing unit and a control unit. The control unit is configured to control the first protection processing unit to form a first protective film on a peripheral portion of a wafer, control the film forming unit to form a resist film on a front surface of the wafer, control the first cleaning processing unit to supply a first cleaning liquid for removing the resist film to the peripheral portion, control the first cleaning processing unit to supply a second cleaning liquid for removing a metal component to the peripheral portion, and control the first cleaning processing unit to supply a third cleaning liquid for removing the first protective film to the peripheralportion.

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