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发明公开
CN109786277A 对薄膜进行计量分析的装置及方法与获得薄膜性质的方法 有权

对薄膜进行计量分析的装置及方法与获得薄膜性质的方法
摘要：
一种对薄膜执行计量分析的方法包括：将辐射耦合到邻近所述薄膜的表面设置的光学元件中。所述辐射被耦合成使得所述辐射在所述光学元件与所述薄膜之间的界面处被全内反射。在所述界面处产生的消散辐射穿透所述薄膜。所述方法还包括：分析被所述薄膜散射的所述消散辐射以获得所述薄膜的性质。
摘要（英）：

A method of performing metrology analysis of a thin film includes coupling a radiation into an optical element disposed adjacent to a surface of the thin film. The radiation is coupled such that the radiation is totally internally reflected at an interface between the optical element and the thin film. An evanescent radiation generated at the interface penetrates the thin film. The method furthersinclude analyzing the evanescent radiation scattered by the thin film to obtain properties of the thin film.

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