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发明公开
CN109844649A 压力控制阀、用于光刻设备的流体处理结构和光刻设备 有权

压力控制阀、用于光刻设备的流体处理结构和光刻设备
摘要：
一种压力控制阀，包括：通路(210)，其具有限定用于使液体和/或气体(215)流动通过的开口(220)的部分；阻塞构件(230)，其能够相对于所述开口移位，以将所述开口阻塞不同的量，由此调节通过所述开口的液体和/或气体的体积流率；压电致动器(250)；以及连杆机构(400)，其适于放大所述压电致动器的尺寸改变的量，并且使用放大后的尺寸改变量来相对于所述开口移动所述阻塞构件，其中，所述连杆机构包括框架(500)，所述框架附接到一壁并且在第一端处相对于所述通路固定，所述框架的可移动部分(508)能够在第一方向上移动，同时在与所述第一方向正交的第二方向上基本上被约束，所述压电致动器在所述壁与所述可移动部分之间延伸，使得所述压电致动器的膨胀引起所述可移动部分在所述第一方向上移动的量大于所述压电致动器的膨胀量，所述可移动部分连接到所述阻塞构件。
摘要（英）：

A pressure control valve comprising: a passageway (210) having a portion defining an opening (220) for the flow of liquid and/or gas (215) therethrough; an obstructing member (230) displaceable relative to the opening for obstructing the opening by differing amounts thereby to regulate a volumetric flow rate of liquid and/or gas through the opening; a piezo actuator (250); and a linkage mechanism(400) adapted to amplify a magnitude of a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the obstructing member relative to the opening, wherein the linkage mechanism comprises a frame (500) attached to a wall and fixed at a first end (510) in relation to the passageway, a movable portion (508) of the frame moveable in a first direction whilst being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the moveable portion such that an expansion of the piezo actuatorresults in movement of the moveable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the obstructing member.

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