The invention belongs to the field of related technologies for nanocrystal preparation and discloses an atomic layer deposition based surface orientation passivation method for nanocrystals. The method comprises the steps: synthesizing nanocrystal colloid by employing a thermal injection process; uniformly imbedding nanocrystal particles into silicon dioxide microspheres by employing a hydrolysismethod; and continuing to deposit metal oxide films on surfaces of the silicon dioxide microspheres uniformly imbedded with the nanocrystal particles by employing an atomic layer deposition technology, thereby completing a whole surface orientation passivating treatment process. The invention further discloses a corresponding product. According to the method and the product, the problem that quantum dots are prone to water-oxygen erosion can be effectively solved, and the product has the advantages of simple preparation process, low preparation cost and the like.