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发明公开
CN110383424A 用于焦点敏感式计量目标的系统及方法 有权

用于焦点敏感式计量目标的系统及方法
摘要：
本发明揭示一种光刻系统，其包含照明源、一或多个投影光学元件及图案掩模。所述照明源包含一或多个照明极。所述图案掩模包含以一节距周期性分布的一组焦点敏感式掩模元件，其中所述组焦点敏感式掩模元件经配置以衍射来自所述一或多个照明极的照明。所述节距经选择使得与所述一或多个照明极中的每一者相关联的照明的两个衍射级在所述一或多个投影光学元件的光瞳平面中不对称地分布。此外，所述一或多个投影光学元件经配置以使用基于与所述一或多个照明极中的每一者相关联的照明的所述两个衍射级的所述组焦点敏感式图案掩模元件的图像来曝光样品。另外，所述样品上的所述组焦点敏感式图案掩模元件的所述图像的一或多个印刷特性指示所述样品在所述一或多个投影光学元件的聚焦体积内的位置。
摘要（英）：

A lithography system includes an illumination source, one or more projection optical elements, and a pattern mask. The illumination source includes one or more illumination poles. The pattern mask includes a set of focus-sensitive mask elements periodically distributed with a pitch, wherein the set of focus-sensitive mask elements is configured to diffract illumination from the one or more illumination poles. The pitch is selected such that two diffraction orders of illumination associated with each of the one or more illumination poles are asymmetrically distributed in a pupil plane of the one or more projection optical elements. Further, the one or more projection optical elements are configured to expose a sample with an image of the set of focus-sensitive pattern mask elements based onthe two diffraction orders of illumination associated with each of the one or more illumination poles. Additionally, one or more printing characteristics of the image of the set of focus-sensitive pattern mask elements on the sample is indicative of a position of the sample within a focal volume of the one or more projection optical elements.

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