发明公开
- 专利标题: Semiconductor device utilizing the resonant-tunneling effect
- 专利标题(中): 使用谐振器隧道效应的半导体器件
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申请号: EP87402369.0申请日: 1987-10-21
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公开(公告)号: EP0268512A3公开(公告)日: 1989-10-25
- 发明人: Futatsugi, Toshiro , Yokoyama, Naoki , Imamura, Kenichi
- 申请人: FUJITSU LIMITED
- 申请人地址: 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 JP
- 专利权人: FUJITSU LIMITED
- 当前专利权人: FUJITSU LIMITED
- 当前专利权人地址: 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 JP
- 代理机构: Joly, Jean-Jacques
- 优先权: JP249572/86 19861022; JP276953/86 19861120
- 主分类号: H01L29/72
- IPC分类号: H01L29/72 ; H01L29/205 ; H01L33/00 ; H01L29/08 ; H01L31/10
摘要:
A semiconductor device utilizing the resonant-tunneling effect, such as a light emitting-resonant-tunneling bipolar transistor, comprises stacked first through fifth semiconductor layers (16, 15B₂, 15W, 15B₁, 13). The semiconductor device has an energy level condition of |Ec₃ - Ec₁ |≒|Ev₃ - Ev₅|, where Ec₃ is a resonant energy level of electrons in a conduction band of the third layer (15W) and Ev₃ is a resonant energy level of holes in a valence band thereof, and Ec₁ is an energy level of a conduction band of the first layer (16) and Ev₅ is an energy level of a valence band of the fifth layer (13).
公开/授权文献
- EP0268512B1 Semiconductor device utilizing the resonant-tunneling effect 公开/授权日:1994-05-25
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