发明公开
EP0502269A1 Method of and system for microwave plasma treatments
失效
Verfahren und Anordnung zum Behandeln mittels Mikrowellenplasmas。
- 专利标题: Method of and system for microwave plasma treatments
- 专利标题(中): Verfahren und Anordnung zum Behandeln mittels Mikrowellenplasmas。
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申请号: EP91301844.6申请日: 1991-03-06
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公开(公告)号: EP0502269A1公开(公告)日: 1992-09-09
- 发明人: Watanabe, Seiichi , Nawata, Makoto , Fukuyama, Ryooji , Kakehi, Yutaka , Kanai, Saburo , Kawasaki, Yoshinao
- 申请人: HITACHI, LTD.
- 申请人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 当前专利权人地址: 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 代理机构: Paget, Hugh Charles Edward
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; H05H1/46
摘要:
Herein disclosed are a microwave plasma treating method and a system therefor. A slow wave structure (19) is disposed in the propagation region of microwaves, and the microwaves are thus introduced at a delayed phase velocity into a discharge chamber 10 in which gases are transformed into plasma. Thus, the phase velocity of the microwaves is adjusted to a relatively low velocity, at which charged particles are distributed most densely in the plasma, so that the energy may be efficiently transformed to much more charged particles in the plasma. Thus, the plasma of high density is generated to improve the plasma treating rate.
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