发明公开
EP1088332A2 FOCUS RING ARRANGEMENT FOR SUBSTANTIALLY ELIMINATING UNCONFINED PLASMA IN A PLASMA PROCESSING CHAMBER
有权
安排一个对焦环进行拆卸UNEINGESCHLOSSENEM等离子体中的等离子体处理kammers
- 专利标题： FOCUS RING ARRANGEMENT FOR SUBSTANTIALLY ELIMINATING UNCONFINED PLASMA IN A PLASMA PROCESSING CHAMBER
- 专利标题（中）： 安排一个对焦环进行拆卸UNEINGESCHLOSSENEM等离子体中的等离子体处理kammers
-
申请号： EP99928846.7申请日： 1999-06-22
-
公开(公告)号： EP1088332A2公开(公告)日： 2001-04-04
- 发明人: LENZ, Eric, H.
- 申请人： LAM RESEARCH CORPORATION
- 申请人地址： 4650 Cushing Parkway Fremont, CA 94538-6470 US
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： 4650 Cushing Parkway Fremont, CA 94538-6470 US
- 代理机构： Browne, Robin Forsythe, Dr.
- 优先权： US105547 19980626
- 国际公布： WO0000992 20000106
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A focus ring assembly configured to substantially encircle a chuck of a plasma processing chamber. The focus ring assembly includes an annular dielectric body; and an electrically conductive shield surrounding the annular dielectric body. The electrically conductive shield is configured to be electrically grounded within the plasma processing chamber and includes a tube-shaped portion being disposed outside of the annular dielectric body and surrounding at least part of the annular dielectric body. The electrically conductive shield further includes an inwardly-protruding flange portion being in electrical contact with the tube-shaped portion. The flange portion forms a plane that intersects the tube-shaped portion. The flange portion is embedded within the annular dielectric body.
公开/授权文献
信息查询
