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16 条记录 (耗时 0.014 秒)

    POWER SEGMENTED ELECTRODE
    4.
    发明授权
    POWER SEGMENTED ELECTRODE 失效
    SEGMENTIERTE LEISTUNGSELEKTRODE

    公开(公告)号：EP0871975B1

    公开(公告)日：2003-08-20

    申请号：EP96922561.4

    申请日：1996-06-20

    申请人： LAM RESEARCH CORPORATION

    发明人： DIBLE, Robert, D. ,  LENZ, Eric, H. ,  LAMBSON, Albert, M.

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32009 ,  H01J37/32532 ,  H01J37/3299

    摘要： A power segmented electrode useful as part of an upper electrode and/or substrate support for supporting a substrate such as a semiconductor wafer in a plasma reaction chamber such as a single wafer etcher. The power segmented electrode includes a plurality of electrodes which are supplied radiofrequency power in a manner which provides uniform processing of the substrate. The power to the electrodes can be supplied through a circuit incorporating interelectrode gap capacitance, one or more variable capacitors, one or more current sensors, a power splitter, one or more DC biasing sources, and/or power amplifier.

    摘要翻译： 功率分段电极，用作上电极和/或基板支架的一部分，用于在诸如单晶片蚀刻器的等离子体反应室中支撑诸如半导体晶片的衬底。 功率分段电极包括以提供基板的均匀处理的方式提供的射频功率的多个电极。 电极的功率可以通过包括电极间间隙电容的电路，一个或多个可变电容器，一个或多个电流传感器，功率分配器，一个或多个DC偏置源和/或功率放大器来供电。

    CAM-BASED ARRANGEMENT FOR POSITIONING CONFINEMENT RINGS IN A PLASMA PROCESSING CHAMBER
    5.
    发明公开
    CAM-BASED ARRANGEMENT FOR POSITIONING CONFINEMENT RINGS IN A PLASMA PROCESSING CHAMBER 有权
    CAM系统的控件来电的等离子体处理室中定位

    公开(公告)号：EP1090408A1

    公开(公告)日：2001-04-11

    申请号：EP99930477.7

    申请日：1999-06-22

    申请人： LAM RESEARCH CORPORATION

    发明人： LENZ, Eric, H.

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32623 ,  Y10S156/915

    摘要： A cam-based arrangement configured to move a confinement ring along a first axis of a plasma processing chamber. The confinement ring is disposed in a plane that is orthogonal to the first axis. The cam-based arrangement includes a cam ring having a plurality of cam regions formed on a first surface of the cam ring. There is further included a plurality of cam followers in rolling contact with the first surface of the cam ring. There is also included a plurality of plungers oriented parallel to the first axis, each of the plurality of plungers being coupled to one of the plurality of cam followers and to the confinement ring, wherein the plurality of plungers move in an orchestrated manner parallel to the first axis as the cam ring is rotated and the plurality of cam followers stay in the rolling contact with the first surface of the cam ring.

    FOCUS RING ARRANGEMENT FOR SUBSTANTIALLY ELIMINATING UNCONFINED PLASMA IN A PLASMA PROCESSING CHAMBER
    6.
    发明公开
    FOCUS RING ARRANGEMENT FOR SUBSTANTIALLY ELIMINATING UNCONFINED PLASMA IN A PLASMA PROCESSING CHAMBER 有权
    安排一个对焦环进行拆卸UNEINGESCHLOSSENEM等离子体中的等离子体处理kammers

    公开(公告)号：EP1088332A2

    公开(公告)日：2001-04-04

    申请号：EP99928846.7

    申请日：1999-06-22

    申请人： LAM RESEARCH CORPORATION

    发明人： LENZ, Eric, H.

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32623 ,  H01J37/32642

    摘要： A focus ring assembly configured to substantially encircle a chuck of a plasma processing chamber. The focus ring assembly includes an annular dielectric body; and an electrically conductive shield surrounding the annular dielectric body. The electrically conductive shield is configured to be electrically grounded within the plasma processing chamber and includes a tube-shaped portion being disposed outside of the annular dielectric body and surrounding at least part of the annular dielectric body. The electrically conductive shield further includes an inwardly-protruding flange portion being in electrical contact with the tube-shaped portion. The flange portion forms a plane that intersects the tube-shaped portion. The flange portion is embedded within the annular dielectric body.

    A METHOD AND AN APPARATUS FOR OFFSETTING PLASMA BIAS VOLTAGE IN BIPOLAR ELECTROSTATIC CHUCKS
    7.
    发明公开
    A METHOD AND AN APPARATUS FOR OFFSETTING PLASMA BIAS VOLTAGE IN BIPOLAR ELECTROSTATIC CHUCKS 失效
    方法和设备用于设置PLASMAVORSPANNUNGSQUELLE在双极板静电

    公开(公告)号：EP0992106A1

    公开(公告)日：2000-04-12

    申请号：EP98932840.6

    申请日：1998-06-24

    申请人： LAM RESEARCH CORPORATION

    发明人： LAMBSON, Albert, M. ,  CAPLE, Rick ,  LENZ, Eric, H. ,  BRAUN, Laura, M. ,  MARSH, Ricky

    IPC分类号： H02N13/00 ,  H01L21/68

    CPC分类号： H01L21/6833 ,  H02N13/00 ,  Y10T279/23

    摘要： A control circuit configured to control a reference voltage of a reference node of an electrostatic chuck power supply is disclosed. The electrostatic chuck power supply is configured to clamp a substrate to a bipolar electrostatic chuck. The electrostatic chuck has a first buried conductor and a second buried conductor. The electrostatic chuck power supply has a first output configured for being coupled with the first buried plate. The first output has a first output voltage referenced to the reference voltage of the reference node. The electrostatic chuck power supply also has a second output configured for being coupled with the second buried plate. The second output has a second output voltage referenced to the reference voltage of the reference node. The control circuit includes: a first resistor coupled in series with the first output; a first amplifier coupled to the first resistor for sensing a voltage drop across the first resistor; a second resistor in series with said second output; and a second amplifier coupled to the second resistor for sensing a voltage drop across the second resistor.

    PERIMETER WAFER LIFTING
    9.
    发明公开
    PERIMETER WAFER LIFTING 审中-公开

    公开(公告)号：EP1166335A1

    公开(公告)日：2002-01-02

    申请号：EP00919728.6

    申请日：2000-03-28

    申请人： LAM Research Corporation

    发明人： LENZ, Eric, H.

    IPC分类号： H01L21/00

    CPC分类号： H01L21/6831 ,  Y10T29/49998

    摘要： The invention relates to an apparatus for lifting a substrate form a surface of a chuck subsequent to a processing step. The apparatus includes a perimeter pin for lifting the substrate from the surface of the chuck to a first position wherein the substrate is disposed on the perimeter pin during lifting. The perimeter pin is configured to overcome a holding force at an interface of the substrate and the surface. Generally, the holding force is generated between the substrate and the surface during the processing step. The apparatus further includes a center pin for moving the substrate from the first position to a second position wherein the substrate is disposed on the center pin during moving. The second position is further away from the surface of the chuck than the first position.

    摘要翻译： 本发明涉及一种用于在处理步骤之后提升基板形成卡盘表面的设备。 该设备包括用于将衬底从卡盘的表面提升到第一位置的周边销，其中在提升期间衬底布置在周边销上。 周边销构造成克服衬底和表面的界面处的保持力。 通常，在处理步骤期间在衬底和表面之间产生保持力。 该设备还包括用于将基板从第一位置移动到第二位置的中心销，其中基板在移动期间设置在中心销上。 第二位置比卡盘的表面更远离第一位置。

    POWER SEGMENTED ELECTRODE
    10.
    发明公开
    POWER SEGMENTED ELECTRODE 失效
    分段电极线

    公开(公告)号：EP0871975A1

    公开(公告)日：1998-10-21

    申请号：EP96922561.0

    申请日：1996-06-20

    申请人： LAM RESEARCH CORPORATION

    发明人： DIBLE, Robert, D. ,  LENZ, Eric, H. ,  LAMBSON, Albert, M.

    IPC分类号： H05H1 ,  H01J37 ,  H01L21

    CPC分类号： H01J37/32009 ,  H01J37/32532 ,  H01J37/3299

    摘要： A power segmented electrode useful as part of an upper electrode and/or substrate support for supporting a substrate such as a semiconductor wafer in a plasma reaction chamber such as a single wafer etcher. The power segmented electrode includes a plurality of electrodes which are supplied radiofrequency power in a manner which provides uniform processing of the substrate. The power to the electrodes can be supplied through a circuit incorporating interelectrode gap capacitance, one or more variable capacitors, one or more current sensors, a power splitter, one or more DC biasing sources, and/or power amplifier.