发明公开
- 专利标题： PLASMA PROCESSING APPARATUS
- 专利标题（中）： EINRICHTUNG ZUR PLASMA-BEHANDLUNG
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申请号： EP99923919申请日： 1999-06-04
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公开(公告)号： EP1096554A4公开(公告)日： 2004-09-29
- 发明人: GOTO NAOHISA , ANDO MAKOTO , ISHII NOBUO
- 申请人： TOKYO ELECTRON LTD , GOTO NAOHISA , ANDO MAKOTO
- 专利权人： TOKYO ELECTRON LTD,GOTO NAOHISA,ANDO MAKOTO
- 当前专利权人： TOKYO ELECTRON LTD,GOTO NAOHISA,ANDO MAKOTO
- 优先权： JP17220898 1998-06-04
- 主分类号： H05H1/46
- IPC分类号： H05H1/46 ; C23C16/00 ; C23C16/511 ; H01J37/32 ; H01L21/00 ; H01L21/203 ; H01L21/3065 ; H05H1/00
摘要：
In the plasma processor, the microwaves generated from a microwave generator (86) are led to a plane antenna (62), which in turn introduces exponentially attenuating microwaves into a container (22) that processes an object (W) in plasma. Microwave absorption means (96) provided in the circumference of the plane antenna (62) absorbs microwaves propagating from the center of the plane antenna (62) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna (62) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.
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