发明公开
EP1301827A4 PHOTOLITHOGRAPHICALLY-PATTERNED OUT-OF-PLANE COIL STRUCTURES AND METHOD OF MAKING
有权
PHOTOLITHOGRAPHISCH GEMUSTERTEAUSSERFLÄCHIGESPULENSTRUKTUREN UND VERFAHREN ZUR ERZEUGUNG
- 专利标题： PHOTOLITHOGRAPHICALLY-PATTERNED OUT-OF-PLANE COIL STRUCTURES AND METHOD OF MAKING
- 专利标题（中）： PHOTOLITHOGRAPHISCH GEMUSTERTEAUSSERFLÄCHIGESPULENSTRUKTUREN UND VERFAHREN ZUR ERZEUGUNG
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申请号： EP01935209申请日： 2001-05-10
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公开(公告)号： EP1301827A4公开(公告)日： 2003-07-09
- 发明人: CHUA CHRISTOPHER L , LEMMI FRANCESCO , VAN SCHUYLENBERGH KOENRAAD F , LU JENG PING , FORK DAVID K , PEETERS ERIC , SUN DECAI , SMITH DONALD L , ROMANO LINDA T
- 申请人： XEROX CORP
- 专利权人： XEROX CORP
- 当前专利权人： XEROX CORP
- 优先权： US57381500 2000-05-17
- 主分类号： H01F41/04
- IPC分类号： H01F41/04 ; G01R1/067 ; G01R3/00 ; G03C5/00 ; H01F17/00 ; H01F17/02 ; H01F27/29 ; H01L21/02 ; H01L21/60 ; H01L21/768 ; H01L23/485 ; H01L23/49 ; H01L23/498 ; H01L23/522 ; H01R9/03 ; H05K7/02 ; G03C5/56 ; G03C5/58 ; G03F7/00 ; H01L21/027 ; H01L33/00
摘要：
An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate (14) plane without requiring high aspect ratio processing. The photolithographically patterned coil structure includes an elastic member (61 a) having an intrinsic stress profile. The intrinsic stress profile biases a free portion (11) away from the substrate (14) forming a loop winding (142). An anchor portion (12) remains fixed to the substrate (14). The free portion end becomes a second anchor portion (61 c) which may be connected to the substrate (14) via soldering or plating. A series of individual coil structures (140) can be joined via their anchor portions to form inductors and transformers.
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