发明公开
EP1371117A4 HIGH REPETITION RATE EXCIMER LASER SYSTEM 有权
麻省理工学院麻省理工学院

HIGH REPETITION RATE EXCIMER LASER SYSTEM
摘要:
The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.
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