公开(公告)号：EP1296899A4

公开(公告)日：2004-11-17

申请号：EP01928353

申请日：2001-04-03

Applicant: CORNING INC

Inventor： ARAUJO ROGER J ,  BORRELLI NICHOLAS F ,  MCLAY ROBERT E ,  SEMPOLINSKI DANIEL R ,  SMITH CHARLENE M

IPC: G02B1/00 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  G03F7/20

CPC classification number: G03F7/70958 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/50 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/40

Abstract: An optical member includes a fused silica glass having a concentration of =SiH moiety below detection limit as measured by Raman spectroscopy and a concentration of molecular hydrogen of at least 1x1017 molecules/cm3. The fused silica glass exhibits an induced absorption level which quickly attains an initial peak upon exposure to irradiation and rapidly decays to a low value. The induced absorption level after decaying to the low value remains substantially unchanged by further irradiation.

公开(公告)号：EP1295153A4

公开(公告)日：2007-08-29

申请号：EP01914510

申请日：2001-02-27

Applicant: CORNING INC

Inventor： MAIER ROBERT L ,  MOORE LISA A ,  SMITH CHARLENE M

IPC: G02B5/20 ,  G02B5/28 ,  G03F7/20 ,  G02B3/00

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and method of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light, VUV, lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices (42) manipulate vacuum ultraviolet lithography light less than 250 nm, utilizing a deposited silicon oxyfluoride film (26). The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract translation: 本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用真空紫外光，VUV，不大于约193nm的光刻波长的低于240nm的光学光刻系统的光学光刻元件，例如VUV投影光刻系统 利用193nm或157nm区域中的波长。 光学装置（42）利用沉积的氟氧化硅膜（26）来操作小于250nm的真空紫外光刻光。 沉积的氟氧化硅光学涂层有助于操纵入射光并保护底层的光学材料，层和表面。

公开(公告)号：EP1266249A4

公开(公告)日：2003-07-16

申请号：EP00970526

申请日：2000-09-29

Applicant: CORNING INC

Inventor： BORRELLI NICHOLAS F ,  ALLAN DOUGLAS C ,  SMITH CHARLENE M

IPC: G02B6/122 ,  G02B6/12 ,  G02B6/13 ,  G02B6/02

CPC classification number: G02B6/13 ,  G02B2006/121 ,  G02B2006/12107 ,  G02B2006/12147 ,  G02B2006/12159

Abstract: A method of writing a light guiding structure (26) in a bulk glass substrate (4) including selecting a bulk glass substrate (4) made from a soft silica based material. An excimer laser beam (5) is focused at a focus point (3) within the substrate while translating the focus relative to the substrate along the scan path. The laser beam (5) is moved at a scan speed so as to induce an increase in the refractive index of the material along the scan path relative to that of the unexposed material, while at the same time incurring very little laser induced breakdown of the material along the scan path. Various optical devices, including waveguides, can be made in this way.

Abstract translation: 一种在散装玻璃基板（4）中写入导光结构（26）的方法，包括选择由软二氧化硅基材料制成的散装玻璃基板（4）。 准分子激光束（5）聚焦在衬底内的焦点（3）处，同时沿扫描路径相对于衬底平移焦点。 激光束（5）以扫描速度移动，以引起材料沿着扫描路径相对于未曝光材料的折射率的增加，同时产生非常少的激光诱发的 材料沿扫描路径。 可以以这种方式制造包括波导在内的各种光学装置。

公开(公告)号：EP1449013A4

公开(公告)日：2006-09-20

申请号：EP02728371

申请日：2002-03-01

Applicant: CORNING INC

Inventor： PELL MICHAEL A ,  SMITH CHARLENE M ,  SPARROW ROBERT W ,  THEN PAUL M ,  GRAY SANDRA LEE

IPC: C30B29/12 ,  C30B11/00 ,  H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225 ,  G02B1/00 ,  B29D11/00 ,  C01D3/02 ,  C01F5/24 ,  C01F5/28 ,  C01F11/18 ,  C01F11/22

CPC classification number: H01S3/225 ,  C30B11/00 ,  C30B29/12 ,  H01S3/034 ,  H01S3/0346 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/106

Abstract: The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.

Abstract translation: 本发明涉及在高重复率的UV准分子激光器，其包括激光束和一个或多个窗口包括哪个氟化镁的来源。 本发明的另一个方面涉及在受激准分子激光器，其包括激光束，一个或多个窗口包括哪个氟化镁和用于退火的一个或多个窗口的源极的源极。 本发明的另一个方面涉及一种制造预定宽度窄激光束的方法。

公开(公告)号：EP1368711A4

公开(公告)日：2006-07-19

申请号：EP01995254

申请日：2001-11-28

Applicant: CORNING INC

Inventor： MOORE LISA A ,  SMITH CHARLENE M

IPC: C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  C03C15/00 ,  G21K5/00

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content

Abstract translation: 公开了具有优选的氟含量<0.5重量％的氟氧化硅玻璃，适合用作用于光刻法应用于190nm以下的VUV波长区域的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在约157nm的波长下是透射的，使得其在157nm波长区域作为光掩模衬底特别有用。 本发明的光掩模衬底是“干燥的”氟氧化硅玻璃，其在真空紫外（VUV）波长区域中显示出非常高的透射率，同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。 除了含氟并且几乎没有或没有OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：EP1405110A4

公开(公告)日：2006-03-22

申请号：EP02726866

申请日：2002-05-14

Applicant: CORNING INC

Inventor： ALLAN DOUGLAS C ,  BORRELLI NICHOLAS F ,  SMITH CHARLENE M ,  STONE BRYAN D

IPC: G02B1/02 ,  C30B33/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G02B1/08 ,  C30B29/12 ,  C30B33/00 ,  G02B1/02 ,  G03F7/70966

Abstract: The invention provides a method of making a crystal direction of the optical calcium fluoride crystal. In a preferred embodiment, the below 194 nm transmitting optical element is a oriented calcium fluoride lens. In a preferred embodiment, the below 194 nm transmitting optical element is a oriented calcium fluoride beam splitter.

公开(公告)号：EP1371117A4

公开(公告)日：2006-10-11

申请号：EP02728380

申请日：2002-03-01

Applicant: CORNING INC

Inventor： PELL MICHAEL A ,  SMITH CHARLENE M ,  THEN PAUL M ,  SPARROW ROBERT W

IPC: C30B29/12 ,  C30B11/00 ,  H01S3/02 ,  H01S3/034 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/225

CPC classification number: H01S3/225 ,  C30B11/00 ,  C30B29/12 ,  H01S3/034 ,  H01S3/0346 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/106

Abstract: The invention relates to an High Repetition Rate UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride. Another aspect of the invention relates to an excimer laser which includes a source of a laser beam, one or more windows which include magnesium fluoride and a source for annealing the one or more windows. Another aspect of the invention relates to a method of producing a predetermined narrow width laser beam.

Abstract translation: 本发明涉及一种高重复率UV准分子激光器，其包括激光束源和包括氟化镁的一个或多个窗口。 本发明的另一方面涉及一种准分子激光器，其包括激光束源，一个或多个窗口，其包括氟化镁和用于退火所述一个或多个窗口的源。 本发明的另一方面涉及一种制造预定的窄宽度激光束的方法。

公开(公告)号：EP1330679A4

公开(公告)日：2006-09-06

申请号：EP01979898

申请日：2001-09-25

Applicant: CORNING INC

Inventor： BORRELLI NICHOLAS F ,  MOLL JOHANNES ,  SMITH CHARLENE M

IPC: G03F7/00 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  C03C23/00 ,  G02B1/00 ,  G03F7/20 ,  H01L21/027 ,  C03B19/09 ,  C03C3/04 ,  G02B13/14

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02 x 1018 molecules/cm3 and about 0.18 x 1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

公开(公告)号：EP1322565A4

公开(公告)日：2005-09-28

申请号：EP01946162

申请日：2001-06-06

Applicant: CORNING INC

Inventor： BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M

IPC: C03B19/02 ,  C03B32/00 ,  C03C3/064 ,  C03C3/091 ,  C03C3/118 ,  C03C4/00 ,  C03C4/04 ,  C03C17/34 ,  C03C23/00 ,  G02B5/18 ,  G02B6/12 ,  G02B6/124 ,  G02B6/125 ,  G02B6/34

CPC classification number: C03C3/118 ,  C03B19/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/31 ,  C03C3/064 ,  C03C3/091 ,  C03C4/0085 ,  C03C4/04 ,  C03C17/3411 ,  C03C23/002 ,  C03C2201/21 ,  G02B6/02114 ,  G02B6/12007 ,  G02B6/124 ,  G02B6/125 ,  G02B2006/12147

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 250 nm provide for the making of refractive index patterns in the glass. With a radiation source below 250 nm, such as a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

公开(公告)号：EP1204977A4

公开(公告)日：2003-08-13

申请号：EP00950775

申请日：2000-07-28

Applicant: CORNING INC

Inventor： BORRELLI NICHOLAS F ,  SMITH CHARLENE M

IPC: G02B6/13 ,  B23K26/00 ,  B23K26/06 ,  G11C13/04 ,  H01S3/00

CPC classification number: G11C13/041 ,  B23K26/0624 ,  G11C13/04

Abstract: The invention relates to methods of writing a light guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380 °K. Pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

Abstract translation: 本发明涉及在本体玻璃基板写一个光导结构的方法。 散装玻璃基板优选地由具有在退火点的软基于二氧化硅的材料制成低于约1380°K，脉冲激光束在基板内聚焦在聚焦在扫描速度相对于沿着一个扫描路径在基板翻译 有效地诱导在沿着扫描路径的材料的折射率增加。基本上材料的没有激光诱导物理损坏沿着扫描路径产生的。可以使用该方法进行各种光学器件。