发明公开
EP1376668A4 MICROWAVE PLASMA PROCESS DEVICE, PLASMA IGNITION METHOD, PLASMA FORMING METHOD, AND PLASMA PROCESS METHOD
有权
迈克尔·威廉·帕克斯·罗伯特·埃里克·辛格，PLASMAZÜNDVERFAHREN，PLASMABILDEVERFAHREN UND PLASMAPROZESSVERFAHREN
- 专利标题： MICROWAVE PLASMA PROCESS DEVICE, PLASMA IGNITION METHOD, PLASMA FORMING METHOD, AND PLASMA PROCESS METHOD
- 专利标题（中）： 迈克尔·威廉·帕克斯·罗伯特·埃里克·辛格，PLASMAZÜNDVERFAHREN，PLASMABILDEVERFAHREN UND PLASMAPROZESSVERFAHREN
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申请号： EP02707230申请日： 2002-03-28
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公开(公告)号： EP1376668A4公开(公告)日： 2006-02-15
- 发明人: OHMI TADAHIRO , HIRAYAMA M , SUGAWA S , GOTO T
- 申请人： TOKYO ELECTRON LTD , OHMI TADAHIRO
- 专利权人： TOKYO ELECTRON LTD,OHMI TADAHIRO
- 当前专利权人： TOKYO ELECTRON LTD,OHMI TADAHIRO
- 优先权： JP2001094277 2001-03-28
- 主分类号： H05H1/46
- IPC分类号： H05H1/46 ; B01J19/08 ; C23C16/511 ; C23C16/517 ; H01J37/32 ; H01L21/205 ; H01L21/265 ; H01L21/302 ; H01L21/3065 ; H01L21/31
摘要：
A microwave plasma process device (10) is provided with a plasma ignition enhancing means for enhancing plasma ignition by microwaves. The plasma ignition enhancing means comprises a deuterium lamp (30) which generates vacuum ultraviolet rays, and a penetration window (32) guiding the vacuum ultraviolet rays, which have penetrated the same, to a plasma excitation space (26). The penetration window (32) is constructed as a convex lens, focusing the vacuum ultraviolet rays to enhance the ionization of the plasma excitation gas. Such arrangement makes it possible to effect plasma ignition easily and rapidly.
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