发明公开
EP1831658A2 MULTIPLE BAND PASS FILTERING FOR PYROMETRY IN LASER BASED ANNEALING SYSTEMS
有权
多带通滤波器,用于在高温计激光辅助退火设备
- 专利标题: MULTIPLE BAND PASS FILTERING FOR PYROMETRY IN LASER BASED ANNEALING SYSTEMS
- 专利标题(中): 多带通滤波器,用于在高温计激光辅助退火设备
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申请号: EP05809879.9申请日: 2005-10-12
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公开(公告)号: EP1831658A2公开(公告)日: 2007-09-12
- 发明人: ADAMS, Bruce, E. , JENNINGS, Dean , HUNTER, Aaron, M. , MAYUR, Abhilash, J. , PARIHAR, Vijay , THOMAS, Timothy, N.
- 申请人: APPLIED MATERIALS, INC.
- 申请人地址: 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 当前专利权人地址: 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构: Zimmermann, Gerd Heinrich
- 优先权: US627527P 20041112; US195380 20050802
- 国际公布: WO2006055130 20060526
- 主分类号: G01J5/06
- IPC分类号: G01J5/06 ; B23K26/073 ; B23K26/03
摘要:
A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
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