公开(公告)号：EP1676300A1

公开(公告)日：2006-07-05

申请号：EP04793905.3

申请日：2004-10-01

申请人： APPLIED MATERIALS, INC.

发明人： AUTRYVE, Luc, Van ,  BENCHER , Chris, D. ,  JENNINGS, Dean ,  LIANG, Haifan ,  MAYUR, Abhilash, J. ,  YAM, Mark ,  YEH, Wendy, H. ,  BROUGH, Richard, A.

IPC分类号： H01L21/268 ,  H01L21/265

CPC分类号： H01L21/26513 ,  H01L21/268

摘要： A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then exposing the substrate to electromagnetic radiation have one or more wavelengths between about 600 nm and about 1000 nm under conditions sufficient to heat the layer to a temperature of at least about 300° C. is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs the electromagnetic radiation and anneals a top surface layer of the substrate. In one aspect, the substrate is exposed to the electromagnetic radiation in a laser annealing process.

公开(公告)号：EP1676300B1

公开(公告)日：2014-10-01

申请号：EP04793905.3

申请日：2004-10-01

申请人： Applied Materials, Inc.

发明人： AUTRYVE, Luc, Van ,  BENCHER , Chris, D. ,  JENNINGS, Dean ,  LIANG, Haifan ,  MAYUR, Abhilash, J. ,  YAM, Mark ,  YEH, Wendy, H. ,  BROUGH, Richard, A.

IPC分类号： H01L21/268 ,  H01L21/265

CPC分类号： H01L21/26513 ,  H01L21/268

摘要： A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then exposing the substrate to electromagnetic radiation have one or more wavelengths between about 600 nm and about 1000 nm under conditions sufficient to heat the layer to a temperature of at least about 300° C. is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs the electromagnetic radiation and anneals a top surface layer of the substrate. In one aspect, the substrate is exposed to the electromagnetic radiation in a laser annealing process.

公开(公告)号：EP1824637A1

公开(公告)日：2007-08-29

申请号：EP05813276.2

申请日：2005-10-12

申请人： Applied Materials, Inc.

发明人： ADAMS, Bruce, E. ,  JENNINGS, Dean ,  HUNTER, Aaron, M. ,  MAYUR, Abhilash, J. ,  PARIHAR, Vijay

IPC分类号： B23K26/42

CPC分类号： B23K26/032 ,  B23K26/03 ,  B23K26/0604 ,  B23K26/0676 ,  B23K26/0738 ,  B23K26/702 ,  B23K2201/40

摘要： A thermal processing system (10) includes a source of laser radiation having an array (34) of lasers emitting light at a laser wavelength, a substrate support, optics (48,52,62,64,66,70) disposed between said source and said substrate support for forming a line beam in a substrate plane of the substrate support from the light emitted by the source of laser radiation, and scanning apparatus (16,18) for effecting movement of said line beam relative to said substrate support in a direction transverse to the longitudinal axis of said line beam. The system further includes a housing (68) encompassing said optics, a light detector (81) disposed inside said housing for sensing an ambient light level, a power supply (100) coupled to the source of laser radiation, and a controller (90) governing said power supply and responsive to said light detector (81) for interrupting said power supply upon an increase in the output of said light detector (81) above a threshold ambient level.

公开(公告)号：EP1507625A1

公开(公告)日：2005-02-23

申请号：EP03747044.0

申请日：2003-04-18

申请人： Applied Materials, INC.

发明人： JENNINGS, Dean C. ,  YAM, Mark ,  MAYUR, Abhilash, J. ,  BEHRENS, Vernon ,  O'BRIEN, Paul, A. ,  TERTITSKI, Leonid, M. ,  GOLDIN, Alexander

IPC分类号： B23K26/00

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2201/34 ,  B23K2201/40 ,  B23K2203/08 ,  B23K2203/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

公开(公告)号：EP1116011A1

公开(公告)日：2001-07-18

申请号：EP99942198.5

申请日：1999-08-13

申请人： APPLIED MATERIALS, INC.

发明人： ADERHOLD, Wolfgang ,  MAYUR, Abhilash, J. ,  KNOOT, Peter, A.

IPC分类号： G01J5/00

CPC分类号： G01J5/0003 ,  G01J5/0007 ,  G01J2005/0048

摘要： A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperature correction value for one or more temperature sensors associated with the chamber. A Gaussian-like distribution for thermal contributions from multiple radiation sources in the chamber can be used to simulate the temperature profile. The simulated temperature profile and the actual temperature profile are combined to form an estimated temperature profile. A final value for each respective temperature correction value is determined using an optimization algorithm which results in the estimated temperature profile being substantially uniform across the surface of the substrate. Each final temperature correction value is used as an offset to temperature measurements obtained from the corresponding temperature sensors.

公开(公告)号：EP1831658B1

公开(公告)日：2016-08-03

申请号：EP05809879.9

申请日：2005-10-12

申请人： Applied Materials, Inc.

发明人： ADAMS, Bruce, E. ,  JENNINGS, Dean ,  HUNTER, Aaron, M. ,  MAYUR, Abhilash, J. ,  PARIHAR, Vijay ,  THOMAS, Timothy, N.

IPC分类号： G02B5/28 ,  H01S5/00 ,  H01S5/40 ,  G01J5/06

CPC分类号： G02B5/281 ,  G01J5/06 ,  H01S5/005 ,  H01S5/4012

公开(公告)号：EP1719158A1

公开(公告)日：2006-11-08

申请号：EP05722937.9

申请日：2005-02-10

申请人： APPLIED MATERIALS, INC.

发明人： MA, Yi ,  AHMED, Khaled, Z. ,  CUNNINGHAM, Kevin, L. ,  MCINTOSH, Robert, C. ,  MAYUR, Abhilash, J. ,  LIANG, Haifan ,  YAM, Mark ,  LEUNG, Toi Yue Becky ,  OLSEN, Christopher ,  WANG, Shulin ,  FOAD, Majeed ,  MINER, Gary, Eugene

IPC分类号： H01L21/28 ,  H01L21/268 ,  H01L21/324

CPC分类号： H01L21/268 ,  H01L21/28035 ,  H01L21/324

摘要： In one embodiment, the invention generally provides a method for annealing a doped layer deposited on a substrate. The method includes depositing a polycrystalline layer on a substrate surface such as a gate oxide layer and implanting the polycrystalline layer with a dopant to form a doped polycrystalline layer. The method further includes exposing the doped polycrystalline layer to a rapid thermal anneal to readily distribute the dopant throughout the polycrystalline layer. Subsequently, the method includes exposing the doped polycrystalline layer to a laser anneal to activate the dopant in an upper portion of the polycrystalline layer. The laser anneal incorporates the dopant, atoms into the crystalline lattice of the polycrystalline material.

公开(公告)号：EP1116011B1

公开(公告)日：2006-03-29

申请号：EP99942198.5

申请日：1999-08-13

申请人： APPLIED MATERIALS, INC.

发明人： ADERHOLD, Wolfgang ,  MAYUR, Abhilash, J. ,  KNOOT, Peter, A.

IPC分类号： G01J5/00

CPC分类号： G01J5/0003 ,  G01J5/0007 ,  G01J2005/0048

摘要： A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperature correction value for one or more temperature sensors associated with the chamber. A Gaussian-like distribution for thermal contributions from multiple radiation sources in the chamber can be used to simulate the temperature profile. The simulated temperature profile and the actual temperature profile are combined to form an estimated temperature profile. A final value for each respective temperature correction value is determined using an optimization algorithm which results in the estimated temperature profile being substantially uniform across the surface of the substrate. Each final temperature correction value is used as an offset to temperature measurements obtained from the corresponding temperature sensors.

公开(公告)号：EP2167272B1

公开(公告)日：2018-01-24

申请号：EP08767856.1

申请日：2008-05-22

申请人： Applied Materials, Inc.

发明人： LI, Jiping ,  ADAMS, Bruce, E. ,  THOMAS, Timothy, N. ,  HUNTER, Aaron, Muir ,  MAYUR, Abhilash, J. ,  RAMANUJAM, Rajesh, S.

IPC分类号： B23K26/04

CPC分类号： B23K26/0665 ,  B23K26/03 ,  B23K26/032 ,  B23K26/034 ,  B23K26/18 ,  B23K2101/40

摘要： In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter (72) having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.

公开(公告)号：EP2342739A1

公开(公告)日：2011-07-13

申请号：EP09814993.3

申请日：2009-09-03

申请人： Applied Materials, Inc.

发明人： MOFFATT, Stephen ,  MAYUR, Abhilash, J. ,  RAMAMURTHY, Sundar ,  RANISH, Joseph ,  HUNTER, Aaron

IPC分类号： H01L21/324

CPC分类号： H01L21/324 ,  H01L21/67115

摘要： A method and apparatus are provided for treating a substrate. The substrate is positioned on a support in a thermal treatment chamber. Electromagnetic radiation is directed toward the substrate to anneal a portion of the substrate. Other electromagnetic radiation is directed toward the substrate to preheat a portion of the substrate. The preheating reduces thermal stresses at the boundary between the preheat region and the anneal region. Any number of anneal and preheat regions are contemplated, with varying shapes and temperature profiles, as needed for specific embodiments. Any convenient source of electromagnetic radiation may be used, such as lasers, heat lamps, white light lamps, or flash lamps.