发明公开
- 专利标题: NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
- 专利标题(中): 感光纳米复合组合物及其用途
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申请号: EP06727393.8申请日: 2006-03-10
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公开(公告)号: EP1877864A2公开(公告)日: 2008-01-16
- 发明人: CHEN, Chunwei , LU, Ping-Hung , ZHUANG, Hong , NEISSER, Mark
- 申请人: AZ Electronic Materials USA Corp.
- 申请人地址: 70 Meister Avenue Somerville, NJ 08876 US
- 专利权人: AZ Electronic Materials USA Corp.
- 当前专利权人: AZ Electronic Materials USA Corp.
- 当前专利权人地址: 70 Meister Avenue Somerville, NJ 08876 US
- 代理机构: Isenbruck, Günter
- 优先权: US103134 20050411
- 国际公布: WO2006109121 20061019
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/038 ; G03F7/027
摘要:
The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator.
公开/授权文献
- EP1877864B1 NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF 公开/授权日:2018-09-19
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