发明公开
- 专利标题： Coating compositions for use with an overcoated photoresist
- 专利标题（中）： 与外涂光刻胶一起使用的涂料组合物
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申请号： EP08168807.9申请日： 2008-11-11
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公开(公告)号： EP2071400A1公开(公告)日： 2009-06-17
- 发明人: Amara, John P , Pugliano, Nicola , Sung, Jin Wuk , Gallagher, Michael K , Castorano, Michael S
- 申请人： Rohm and Haas Electronic Materials LLC
- 申请人地址： 455 Forest Street Marlborough, MA 01752 US
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： 455 Forest Street Marlborough, MA 01752 US
- 代理机构： Buckley, Guy Julian
- 优先权： US2872P 20071112
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; G03F7/09
摘要：
In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.
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