Coating compositions for use with an overcoated photoresist
    1.
    发明公开
    Coating compositions for use with an overcoated photoresist 审中-公开
    与外涂光刻胶一起使用的涂料组合物

    公开(公告)号:EP2071400A1

    公开(公告)日:2009-06-17

    申请号:EP08168807.9

    申请日:2008-11-11

    IPC分类号: G03F7/075 G03F7/09

    CPC分类号: G03F7/091 G03F7/0752

    摘要: In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.

    摘要翻译: 一方面,本发明涉及含有重复单元的含硅有机涂料组合物,特别是抗反射涂料组合物,其中发色团部分例如苯基与Si原子间隔开。 另一方面,提供配制成液体(有机溶剂)组合物的含硅底层组合物,其中溶剂组分的至少一种溶剂包含羟基。