Invention Publication
- Patent Title: REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM
- Patent Title (中): 反应溅射沉积的透明导电膜
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Application No.: EP07865841.6Application Date: 2007-12-19
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Publication No.: EP2099949A1Publication Date: 2009-09-16
- Inventor: LI, Yanping , YE, Yan , CHAE, Yong-Kee , WON, Tae Kyung , KADAM, Ankur , SHENG, Shuran , LI, Liwei
- Applicant: Applied Materials, Inc.
- Applicant Address: 3050 Bowers Avenue Santa Clara, CA 95054 US
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, CA 95054 US
- Agency: Zimmermann & Partner
- Priority: US614461 20061221
- International Announcement: WO2008079837 20080703
- Main IPC: C23C14/00
- IPC: C23C14/00
Abstract:
Methods for sputter depositing a transparent conductive oxide (TCO) layer are provided in the present invention. The transparent conductive oxide layer may be utilized as a back reflector in a photovoltaic device. In one embodiment, the method includes providing a substrate in a processing chamber, forming a first portion of a transparent conductive oxide layer on the substrate by a first sputter deposition step, and forming a second portion of the transparent conductive oxide layer by a second sputter deposition step.
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