发明公开
- 专利标题: Ion sources, systems and methods
- 专利标题(中): 离子源,系统和方法
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申请号: EP11182566.7申请日: 2006-11-15
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公开(公告)号: EP2416343A3公开(公告)日: 2013-06-05
- 发明人: Mantz, Ulrich , Steigerwald, Michael , Ward, Billy W. , Notte, John A. , Farkas, Louis , Percival, Randall , Hill, Raymond
- 申请人: Alis Corporation
- 申请人地址: 10 Technology Drive Peabody, MA 01960 US
- 专利权人: Alis Corporation
- 当前专利权人: Alis Corporation
- 当前专利权人地址: 10 Technology Drive Peabody, MA 01960 US
- 代理机构: Carl Zeiss AG - Patentabteilung
- 优先权: US741956P 20051202; US385215 20060320; US385136 20060320; US784390P 20060320; US784388P 20060320; US784331P 20060320; US784500P 20060320; US795806P 20060428; US799203P 20060509
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J9/02 ; H01J37/08 ; H01J37/252 ; H01J37/305 ; H01J37/317 ; B81B1/00 ; H01J27/26 ; B82Y10/00 ; H01J37/20
摘要:
The present invention refers to a system, comprising a scanning electron microscope capable of providing an electron beam and a gas field ion source (120) capable of interacting with a gas (182) to generate an ion beam (192). The scanning electron microscope and the gas field ion microscope (100) are positioned so that, during use, both the electron beam and the ion beam can be used to investigate a sample (180). A system according to the present invention also comprises a focused ion beam instrument.
The figure published with the abstract only shows the gas field ion microscope (100).
The figure published with the abstract only shows the gas field ion microscope (100).
公开/授权文献
- EP2416343B1 Ion sources, systems and methods 公开/授权日:2019-01-02
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