发明公开
EP2416343A3 Ion sources, systems and methods 审中-公开
离子源,系统和方法

Ion sources, systems and methods
摘要:
The present invention refers to a system, comprising a scanning electron microscope capable of providing an electron beam and a gas field ion source (120) capable of interacting with a gas (182) to generate an ion beam (192). The scanning electron microscope and the gas field ion microscope (100) are positioned so that, during use, both the electron beam and the ion beam can be used to investigate a sample (180). A system according to the present invention also comprises a focused ion beam instrument.
The figure published with the abstract only shows the gas field ion microscope (100).
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