Ion sources, systems and methods
    3.
    发明公开
    Ion sources, systems and methods 审中-公开
    离子源,系统和方法

    公开(公告)号:EP2418674A3

    公开(公告)日:2013-06-05

    申请号:EP11183114.5

    申请日:2006-11-15

    申请人: Alis Corporation

    摘要: The present invention refers to a system comprising a gas field ion source (120) capable of interacting with a gas (182) to generate an ion beam (192) and an ion optics (130) configured to focus the ion beam onto a surface (181) of a sample (180) so that the ion beam can interact with a sample to cause particles (194) to leave the sample, wherein the ion beam has a spot size with a dimension of 10 nm or less at the surface of the sample. The system also comprises at least one detector (150), which is configured so that, during use, the at least one detector can detect secondary ions (194) emitted by the sample due to the interaction of the ion beam with the surface of the sample, wherein the at least one detector is further configured to analyse the detected secondary ions according to their mass. The system according to the present invention also comprises an electronic processor that can process information based on the detected secondary ions to determine information about the mass of the detected secondary ions.

    摘要翻译: 本发明涉及一种系统,该系统包括能够与气体(182)相互作用以产生离子束(192)的气体场离子源(120)和配置成将离子束聚焦到表面上的离子光学器件(130) 样品(180)的表面(181),使得离子束可以与样品相互作用以使粒子(194)离开样品,其中离子束具有在其表面上的尺寸为10nm或更小的点尺寸 样品。 该系统还包括至少一个检测器(150),该检测器被配置为使得在使用期间,至少一个检测器可以检测由于离子束与第一离子束的表面相互作用而由样品发射的第二离子(194) 样品,其中所述至少一个检测器进一步配置成根据它们的质量分析检测到的二级离子。 根据本发明的系统还包括电子处理器,其可以基于检测到的二次离子处理信息以确定关于检测到的二次离子的质量的信息。

    Ion sources, systems and methods
    5.
    发明公开
    Ion sources, systems and methods 审中-公开
    Ionquellen,Systeme und Verfahren

    公开(公告)号:EP2418674A2

    公开(公告)日:2012-02-15

    申请号:EP11183114.5

    申请日:2006-11-15

    申请人: Alis Corporation

    摘要: The present invention refers to a system comprising a gas field ion source (120) capable of interacting with a gas (182) to generate an ion beam (192) and an ion optics (130) configured to focus the ion beam onto a surface (181) of a sample (180) so that the ion beam can interact with a sample to cause particles (194) to leave the sample, wherein the ion beam has a spot size with a dimension of 10 nm or less at the surface of the sample. The system also comprises at least one detector (150), which is configured so that, during use, the at least one detector can detect secondary ions (194) emitted by the sample due to the interaction of the ion beam with the surface of the sample, wherein the at least one detector is further configured to analyse the detected secondary ions according to their mass. The system according to the present invention also comprises an electronic processor that can process information based on the detected secondary ions to determine information about the mass of the detected secondary ions.

    摘要翻译: 本发明涉及一种系统,其包括能够与气体(182)相互作用以产生离子束(192)的气体离子源(120)和配置成将离子束聚焦到表面上的离子光学器件(130) 181),使得离子束可以与样品相互作用以使得颗粒(194)离开样品,其中离子束在该表面处具有尺寸为10nm或更小的点尺寸 样品。 该系统还包括至少一个检测器(150),其被配置为使得在使用期间,至少一个检测器可以检测由样品发射的二次离子(194),这是由于离子束与表面的相互作用 样品,其中所述至少一个检测器进一步配置为根据其质量分析检测到的次级离子。 根据本发明的系统还包括电子处理器,其可以基于检测到的次级离子来处理信息以确定关于检测到的次级离子的质量的信息。