发明公开
- 专利标题: 193NM LASER AND INSPECTION SYSTEM
- 专利标题(中): 193nm的激光和检查系统,以便
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申请号: EP14742754申请日: 2014-01-24
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公开(公告)号: EP2949015A4公开(公告)日: 2016-09-07
- 发明人: CHUANG YUNG-HO ALEX , ARMSTRONG J JOSEPH , DRIBINSKI VLADIMIR , DENG YUJUN , FIELDEN JOHN
- 申请人: KLA TENCOR CORP
- 专利权人: KLA TENCOR CORP
- 当前专利权人: KLA TENCOR CORP
- 优先权: US201361756209 2013-01-24
- 主分类号: H01S3/00
- IPC分类号: H01S3/00 ; G01N21/95 ; G01N21/956 ; G02F1/35 ; G02F1/39
摘要:
A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.
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