公开(公告)号：EP2522056A4

公开(公告)日：2013-09-25

申请号：EP11732035

申请日：2011-01-03

Applicant: KLA TENCOR CORP

Inventor： DRIBINSKI VLADIMIR ,  CHUANG YUNG-HO ALEX

IPC: H01S3/10 ,  H01S3/113

CPC classification number: H01S3/10 ,  G02F1/3525 ,  H01S3/005 ,  H01S3/091

Abstract: Laser-induced damage in an optical material can be mitigated by creating conditions at which light absorption is minimized. Specifically, electrons populating defect energy levels of a band gap in an optical material can be promoted to the conduction band—a process commonly referred to as bleaching. Such bleaching can be accomplished using a predetermined wavelength that ensures minimum energy deposition into the material, ideally promoting electron to just inside the conduction band. In some cases phonon (i.e. thermal) excitation can also be used to achieve higher depopulation rates. In one embodiment, a bleaching light beam having a wavelength longer than that of the laser beam can be combined with the laser beam to depopulate the defect energy levels in the band gap. The bleaching light beam can be propagated in the same direction or intersect the laser beam.

公开(公告)号：EP2949015A4

公开(公告)日：2016-09-07

申请号：EP14742754

申请日：2014-01-24

Applicant: KLA TENCOR CORP

Inventor： CHUANG YUNG-HO ALEX ,  ARMSTRONG J JOSEPH ,  DRIBINSKI VLADIMIR ,  DENG YUJUN ,  FIELDEN JOHN

IPC: H01S3/00 ,  G01N21/95 ,  G01N21/956 ,  G02F1/35 ,  G02F1/39

CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

公开(公告)号：EP2984205A4

公开(公告)日：2017-01-18

申请号：EP14782555

申请日：2014-04-10

Applicant: KLA-TENCOR CORP

Inventor： DRIBINSKI VLADIMIR ,  CHUANG YUNG-HO ALEX

IPC: C30B7/00 ,  C30B9/00 ,  C30B29/10 ,  C30B29/22 ,  C30B33/02 ,  G01N21/84 ,  G01N21/87 ,  G01N21/95 ,  G01N21/956

CPC classification number: C30B33/02 ,  C30B7/00 ,  C30B9/00 ,  C30B29/10 ,  C30B29/22 ,  G01N21/87 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8477 ,  Y10T117/1016 ,  Y10T117/1024

公开(公告)号：EP2742570A4

公开(公告)日：2015-06-03

申请号：EP12816820

申请日：2012-06-28

Applicant: KLA TENCOR CORP

Inventor： DRIBINSKI VLADIMIR ,  CHUANG YUNG-HO ALEX ,  ARMSTRONG JOSEPH J ,  FIELDEN JOHN

IPC: H01S3/098 ,  G01N21/88 ,  G02F1/37 ,  H01S3/109

CPC classification number: H01S5/0092 ,  C03B33/02 ,  C30B1/02 ,  C30B29/10 ,  C30B29/14 ,  C30B29/22 ,  C30B29/30 ,  C30B33/02 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N2201/06113 ,  G01N2201/0637 ,  G01N2201/068 ,  G02F1/353 ,  G02F1/3551 ,  G02F1/3553 ,  G02F1/37 ,  G02F2001/3505 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2202/20 ,  H01S3/0092 ,  H01S3/10 ,  H01S3/10038 ,  H01S3/10046 ,  H01S3/11

Abstract: A mode-locked laser system operable at low temperature can include an annealed, frequency-conversion crystal and a housing to maintain an annealed condition of the crystal during standard operation at the low temperature. In one embodiment, the crystal can have an increased length. First beam shaping optics can be configured to focus a beam from a light source to an elliptical cross section at a beam waist located in or proximate to the crystal. A harmonic separation block can divide an output from the crystal into beams of different frequencies separated in space. In one embodiment, the mode-locked laser system can further include second beam shaping optics configured to convert an elliptical cross section of the desired frequency beam into a beam with a desired aspect ratio, such as a circular cross section.

Abstract translation: 可操作以在低温下的锁模激光器系统可包括退火，频率变换晶体和外壳以维持在标准操作在低温下的结晶的退火状态。 在一个中，实施例的晶体可以具有上增加的长度。 第一光束成形光学器件可以被配置为在椭圆形的横截面从一个光源聚焦光束以在位于或接近晶体束腰。 谐波分离块可以划分到从晶体输出到在空间上分离不同频率的光束。 在一个中，实施例的锁模激光系统可包括被配置为转换为所需的频率光束的椭圆形横截面成光束具有所需的纵横比，颜色此外第二光束成形光学器件：例如圆形的横截面。

公开(公告)号：EP2764403A4

公开(公告)日：2015-04-15

申请号：EP12838919

申请日：2012-10-05

Applicant: KLA TENCOR CORP

Inventor： CHUANG YUNG-HO ,  DRIBINSKI VLADIMIR

IPC: C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/95

CPC classification number: H01L21/3003 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/3595 ,  G01N2021/8477 ,  G01N2021/8822 ,  G01N2201/06113 ,  H01L21/322 ,  H01S3/027 ,  H01S3/094 ,  H01S3/109 ,  H01S3/1666