- 专利标题: SUBSTRATE HOLDER AND LITHOGRAPHIC APPARATUS
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申请号: EP20160382.6申请日: 2013-01-17
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公开(公告)号: EP3683627A1公开(公告)日: 2020-07-22
- 发明人: DONDERS, Sjoerd Nicolaas Lambertus , LAFARRE, Raymond Wilhelmus Louis , DZIOMKINA, Nina Vladimirovna , KARADE, Yogesh. Pramod , RODENBURG, Elisabeth Corinne , TEN KATE, Nicolaas
- 申请人: ASML Netherlands B.V.
- 申请人地址: P.O. Box 324 5500 AH Veldhoven NL
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: P.O. Box 324 5500 AH Veldhoven NL
- 代理机构: Dung, Shiang-Lung
- 优先权: US201261594857P 20120203; US201261621648P 20120409; US201261621660P 20120409
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.
A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.
A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.
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