- 专利标题: DUAL BEAM BIFOCAL CHARGED PARTICLE MICROSCOPE
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申请号: EP21164758.1申请日: 2021-03-25
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公开(公告)号: EP3889993A1公开(公告)日: 2021-10-06
- 发明人: Henstra, Alexander , Deng, Yuchen , Kohr, Holger , Mohammadi-Gheidari, Ali
- 申请人: FEI Company
- 申请人地址: US Hillsboro, OR 97124-5793 5350 NE Dawson Creek Drive
- 代理机构: Janssen, Francis-Paul
- 优先权: US202016834963 20200330
- 主分类号: H01J37/04
- IPC分类号: H01J37/04 ; H01J37/26
摘要:
Methods and systems for investigating a sample using a dual beam bifocal charged particle microscope, according to the present disclosure include emitting a plurality of charged particles toward the sample, forming the plurality of charged particles into a first charged particle beam and a second charged particle beam, and modifying the focal properties of at least one of the first charged particle beam and the second charged particle beam. The focal properties of at least one of the first charged particle beam and the second charged particle beam is modified such that the corresponding focal planes of the first charged particle beam and the second charged particle beam are different.
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