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公开(公告)号：EP4030461A1
公开(公告)日：2022-07-20
申请号：EP21214240.0
申请日：2021-12-14
申请人： FEI Company
发明人： Henstra, Alexander , Dona, Pleun
IPC分类号： H01J37/153 , H01J37/145 , H01J37/147 , H01J37/26
摘要： Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01Ω -1 . The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2x, 3x, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.
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公开(公告)号：EP3742470A2
公开(公告)日：2020-11-25
申请号：EP20175199.7
申请日：2020-05-18
申请人： FEI Company
摘要： Variable multi-beam charged particle devices for inspection of a sample include a multi-beam source that produces a plurality of charged particle beamlets, an objective lens, a sample holder for holding the sample between the objective lens and the multi-beam source, and a focusing column that directs the plurality of charged particle beamlets so that they are incident upon the sample. The focusing column directs the plurality of charged beams such that there are one or more crossovers of the plurality of charged particle beamlets, where each crossover corresponds to a point where the plurality of charged particle beamlets pass through a common location. The variable multi-beam charged particle devices also include a variable aperture that is configured to vary the current of the plurality of charged particle beamlets, and which is located at a final crossover of the one or more crossovers that is most proximate to the sample.
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公开(公告)号：EP3591685A1
公开(公告)日：2020-01-08
申请号：EP18182145.5
申请日：2018-07-06
申请人： FEI Company
发明人： Henstra, Alexander , Dona, Pleun
摘要： An Electron Microscope M comprising:
- A specimen holder H, for holding a specimen S;
- A source 4, for producing a beam B of electrons;
- An illumination system 6, for directing said beam so as to irradiate the specimen;
- An elongate beam conduit B", through which the beam is directed;
- A detector 26, 30, 32, 34, for detecting radiation emanating from the specimen in response to said irradiation,
wherein at least a longitudinal portion of said beam conduit has a composite structure comprising:
- An outer tube 50 of electrically insulating material;
- An inner skin 52 of electrically conductive material.
In an alternative but related structure, at least a longitudinal portion of said beam conduit is comprised of an aggregate composite material comprising intermixed electrically insulating material and electrically conductive material.-
公开(公告)号：EP3496129A1
公开(公告)日：2019-06-12
申请号：EP17205782.0
申请日：2017-12-07
申请人： FEI Company
摘要： A method of using a Transmission Charged Particle Microscope comprising:
- A specimen holder, for holding a specimen;
- A source, for producing a beam of charged particles;
- An illuminator, for directing said beam so as to irradiate the specimen;
- An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device;
- A controller, for controlling at least some operational aspects of the microscope, in which method the sensing device is chosen to be an EELS/EFTEM module comprising:
- An entrance plane;
- An image plane, where in EELS mode an EELS spectrum is formed and in EFTEM mode an EFTEM image is formed;
- A slit plane between said entrance plane and image plane, where in EFTEM mode an energy dispersed focus is formed;
- A dispersing device, between said entrance plane and slit plane, for dispersing an incoming beam into an energy-dispersed beam with an associated dispersion direction;
- A first series of quadrupoles between said dispersing device and slit plane;
- A second series of quadrupoles between said slit plane and image plane, which dispersing device and quadrupoles are arranged along an optical axis, whereby, for a Cartesian coordinate system (X,Y,Z) in which said optical axis is disposed along Z, said dispersion direction is defined as being parallel to X,
comprising the following steps:
- In said first quadrupole series, exciting one or more quadrupoles so as to deflect an off-axis non-dispersive YZ ray leaving said dispersing device onto a path paraxial to said optical axis from said slit plane to said image plane;
- In said second quadrupole series, exciting either:
(a) A single quadrupole; or
(b) A pair of adjacent quadrupoles,
so as to focus said energy-dispersed beam onto said image plane.-
公开(公告)号：EP3065160B1
公开(公告)日：2017-12-20
申请号：EP15192573.2
申请日：2015-11-02
申请人： FEI Company
CPC分类号： H01J37/28 , H01J37/05 , H01J37/14 , H01J37/22 , H01J37/263 , H01J2237/057 , H01J2237/1534 , H01J2237/2802
摘要： The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled in the art of developing and tuning a PCF, as it reduces the number of degrees of freedom to a manageable amount. Inventors found ways to determine settings of the optical elements before the slit plane for EELS mode that are different from the EFTEM mode and where the performance of the PCF in EELS mode is improved (especially the relative energy range that can be imaged) without degrading the performance of the PCF in EFTEM mode.
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公开(公告)号：EP2838109A1
公开(公告)日：2015-02-18
申请号：EP14180462.5
申请日：2014-08-11
申请人： FEI Company
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/147 , H01J37/22 , H01J37/26 , H01J37/263 , H01J2237/006 , H01J2237/2605 , H01J2237/262
摘要： An Environmental Transmission Electron Microscope suffers from gas-induced resolution deterioration. It is found that this deterioration was not a function of the current density on the sample, but of the total current of the beam of electrons. Inventors conclude that the deterioration is due to ionization of gas in the sample chamber of the ETEM, and propose to use an electric field in the sample chamber to remove the ionized gas, thereby diminishing the gas-induced resolution deterioration. The electric field need not be a strong field, and can be caused by, for example, biasing the sample 114 with respect to the sample chamber 138. A bias voltage of 100 V applied via voltage source 144 is sufficient for a marked improvement the gas-induced resolution deterioration. Polarization is not important. Alternatively an electric field perpendicular to the optical axis 104 can be used, for example by placing an electrically biased wire or gauze 154 off-axis in the sample chamber.
摘要翻译： 环境透射电子显微镜遭受气体引起的分辨率恶化。 发现这种劣化不是样品上电流密度的函数，而是电子束总电流的函数。 发明人得出结论：劣化是由于ETEM的样品室中的气体电离造成的，并且建议使用样品室中的电场来去除电离的气体，由此减少气体引起的分辨率劣化。 电场不需要是强场，并且可以由例如相对于样品室138偏置样品114引起。通过电压源144施加的100V偏压足以显着改善气体 导致分辨率恶化。 极化并不重要。 或者，可以使用垂直于光轴104的电场，例如通过在样品室中离轴地放置电偏置电线或纱布154。
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公开(公告)号：EP2128886B1
公开(公告)日：2010-10-13
申请号：EP09160973.5
申请日：2009-05-25
申请人： FEI Company
发明人： Henstra, Alexander
IPC分类号： H01J37/05 , H01J37/09 , H01J37/147 , H01J37/153 , H01J37/04
CPC分类号： H01J37/05 , H01J3/027 , H01J3/04 , H01J37/063 , H01J2237/045 , H01J2237/057 , H01J2237/061 , H01J2237/08 , H01J2237/15 , H01J2237/1534
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公开(公告)号：EP1566826B1
公开(公告)日：2009-01-14
申请号：EP05075340.9
申请日：2005-02-11
申请人： FEI COMPANY
IPC分类号： H01J37/153 , H01J37/09 , H01J37/26
CPC分类号： H01J37/05 , H01J37/09 , H01J37/153 , H01J37/26
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公开(公告)号：EP4318546A2
公开(公告)日：2024-02-07
申请号：EP23206141.6
申请日：2021-03-25
申请人： FEI Company
发明人： Henstra, Alexander , Deng, Yuchen , Kohr, Holger
IPC分类号： H01J37/26
摘要： Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
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公开(公告)号：EP3889993A1
公开(公告)日：2021-10-06
申请号：EP21164758.1
申请日：2021-03-25
申请人： FEI Company
摘要： Methods and systems for investigating a sample using a dual beam bifocal charged particle microscope, according to the present disclosure include emitting a plurality of charged particles toward the sample, forming the plurality of charged particles into a first charged particle beam and a second charged particle beam, and modifying the focal properties of at least one of the first charged particle beam and the second charged particle beam. The focal properties of at least one of the first charged particle beam and the second charged particle beam is modified such that the corresponding focal planes of the first charged particle beam and the second charged particle beam are different.
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