发明公开
- 专利标题： MASK ASSEMBLY
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申请号： EP23206063.2申请日： 2015-11-16
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公开(公告)号： EP4296778A2公开(公告)日： 2023-12-27
- 发明人: AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL 5500 AH Veldhoven P.O. Box 324
- 代理机构： ASML Netherlands B.V.
- 优先权： US201562183342 P 20150623
- 主分类号： G03F1/64
- IPC分类号： G03F1/64
摘要：
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
公开/授权文献
- EP4296778A3 MASK ASSEMBLY 公开/授权日：2024-03-27
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