公开(公告)号：EP4296778A3

公开(公告)日：2024-03-27

申请号：EP23206063.2

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： AZEREDO LIMA, Jorge, Manuel ,  BOGAART, Erik, Willem ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  BRULS, Richard, Joseph ,  DEKKERS, Jeroen ,  JANSEN, Maarten ,  JANSSEN, Paul ,  KAMALI, Mohammad, Reza ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik, Roelof ,  LYONS, Joseph, Harry ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC分类号： G03F1/62 ,  G03F1/64 ,  G03F7/20 ,  G03F1/00

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP4286941A3

公开(公告)日：2024-03-06

申请号：EP23203497.5

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： AZEREDO LIMA, Jorge, Manuel ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  DE KLERK, Angelo, Cesar, Peter ,  DEKKERS, Jeroen ,  DINGS, Jacobus, Maria ,  JANSEN, Maarten, Mathijs, Marinus ,  JANSSEN, Maurice, Leonardus, Johannes ,  JANSSEN, Paul ,  KERSTENS, Roland, Jacobus, Johannes ,  KESTER, Martinus, Jozef, Maria ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LOOPSTRA, Erik, Roelof ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester, Matheus ,  THEUERZEIT, Frank, Johannes, Christiaan ,  VAN DEN BOSCH, Gerrit ,  VAN DER MEULEN, Frits ,  VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC分类号： G03F1/62 ,  G03F7/20 ,  G03F1/00

摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP4296778A2

公开(公告)日：2023-12-27

申请号：EP23206063.2

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： AZEREDO LIMA, Jorge, Manuel ,  BOGAART, Erik, Willem ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  BRULS, Richard, Joseph ,  DEKKERS, Jeroen ,  JANSEN, Maarten ,  JANSSEN, Paul ,  KAMALI, Mohammad, Reza ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik, Roelof ,  LYONS, Joseph, Harry ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC分类号： G03F1/64

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP4286941A2

公开(公告)日：2023-12-06

申请号：EP23203497.5

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： AZEREDO LIMA, Jorge, Manuel ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  DE KLERK, Angelo, Cesar, Peter ,  DEKKERS, Jeroen ,  DINGS, Jacobus, Maria ,  JANSEN, Maarten, Mathijs, Marinus ,  JANSSEN, Maurice, Leonardus, Johannes ,  JANSSEN, Paul ,  KERSTENS, Roland, Jacobus, Johannes ,  KESTER, Martinus, Jozef, Maria ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LOOPSTRA, Erik, Roelof ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester, Matheus ,  THEUERZEIT, Frank, Johannes, Christiaan ,  VAN DEN BOSCH, Gerrit ,  VAN DER MEULEN, Frits ,  VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC分类号： G03F1/64

摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.