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公开(公告)号：EP4296778A3
公开(公告)日：2024-03-27
申请号：EP23206063.2
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP3345053A1
公开(公告)日：2018-07-11
申请号：EP16757252.8
申请日：2016-08-26
发明人： HOUWELING, Zomer, Silvester , CASIMIRI, Eric, Willem, Felix , DRUZHININA, Tamara , JANSSEN, Paul , KUIJKEN, Michael, Alfred, Josephus , LEENDERS, Martinus, Hendrikus, Antonius , OOSTERHOFF, Sicco , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC分类号： G03F1/62
CPC分类号： G03F1/62 , G03F7/70983
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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公开(公告)号：EP4160315A1
公开(公告)日：2023-04-05
申请号：EP22202401.0
申请日：2016-02-01
发明人： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：EP4020087A1
公开(公告)日：2022-06-29
申请号：EP22153676.6
申请日：2016-02-01
发明人： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：EP4286941A3
公开(公告)日：2024-03-06
申请号：EP23203497.5
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DE KLERK, Angelo, Cesar, Peter , DEKKERS, Jeroen , DINGS, Jacobus, Maria , JANSEN, Maarten, Mathijs, Marinus , JANSSEN, Maurice, Leonardus, Johannes , JANSSEN, Paul , KERSTENS, Roland, Jacobus, Johannes , KESTER, Martinus, Jozef, Maria , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN DEN BOSCH, Gerrit , VAN DER MEULEN, Frits , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP4296778A2
公开(公告)日：2023-12-27
申请号：EP23206063.2
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC分类号： G03F1/64
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP4286941A2
公开(公告)日：2023-12-06
申请号：EP23203497.5
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DE KLERK, Angelo, Cesar, Peter , DEKKERS, Jeroen , DINGS, Jacobus, Maria , JANSEN, Maarten, Mathijs, Marinus , JANSSEN, Maurice, Leonardus, Johannes , JANSSEN, Paul , KERSTENS, Roland, Jacobus, Johannes , KESTER, Martinus, Jozef, Maria , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN DEN BOSCH, Gerrit , VAN DER MEULEN, Frits , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC分类号： G03F1/64
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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