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公开(公告)号：EP4134748A1
公开(公告)日：2023-02-15
申请号：EP21191135.9
申请日：2021-08-12
发明人： HUANG, Zhuangxiong , GUAN, Tiannan , ENGELEN, Johannes, Bernardus, Charles , NAKIBOGLU, Günes , KRUIZINGA, Matthias , VAN GILS, Petrus, Jacobus, Maria , TRALLI, Aldo , DE VRIES, Sjoerd, Frans , TEUNISSEN, Marcel, Maria, Cornelius, Franciscus , BRULS, Richard, Joseph , VAN DER MEULEN, Frits
IPC分类号： G03F7/20 , H01L21/683
摘要： The invention relates to an electrostatic holder comprising:
- a body, and
- a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object,
wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.-
公开(公告)号：EP4296778A2
公开(公告)日：2023-12-27
申请号：EP23206063.2
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC分类号： G03F1/64
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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3.发明公开
公开(公告)号：EP4094125A1
公开(公告)日：2022-11-30
申请号：EP20838574.0
申请日：2020-12-24
发明人： ALBRIGHT, Ronald, Peter , BAL, Kursat , BANINE, Vadim, Yevgenyevich , BRULS, Richard, Joseph , DE VRIES, Sjoerd, Frans , FRIJNS, Olav, Waldemar, Vladimir , HUANG, Yang-Shan , HUANG, Zhuangxiong , JACOBS, Johannes, Henricus, Wilhelmus , MOORS, Johannes, Hubertus, Josephina , NENCHEV, Georgi, Nenchev , NIKIPELOV, Andrey , RAASVELD, Thomas, Maarten , RANJAN, Manish , TE SLIGTE, Edwin , UMSTADTER, Karl, Robert , UZGÖREN, Eray , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
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公开(公告)号：EP4296778A3
公开(公告)日：2024-03-27
申请号：EP23206063.2
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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