发明公开
- 专利标题: ELECTRON DIFFRACTION HOLOGRAPHY
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申请号: EP23206141.6申请日: 2021-03-25
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公开(公告)号: EP4318546A2公开(公告)日: 2024-02-07
- 发明人: Henstra, Alexander , Deng, Yuchen , Kohr, Holger
- 申请人: FEI Company
- 申请人地址: US Hillsboro, OR 97124-5793 5350 NE Dawson Creek Drive
- 代理机构: Janssen, Francis-Paul
- 优先权: US202016835129 20200330
- 主分类号: H01J37/26
- IPC分类号: H01J37/26
摘要:
Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
公开/授权文献
- EP4318546A3 ELECTRON DIFFRACTION HOLOGRAPHY 公开/授权日:2024-04-24
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