PROBLEM TO BE SOLVED: To provide a new monomer having a cyclohexane structure replaced with a plurality of alkyl groups and capable of providing a polymer such as a resist material responsive to high energy beam, excellent in sensitivity, resolution property and etching resistance and useful for fine processing with electron beam and far-ultraviolet light and to provide a method for producing the monomer. SOLUTION: The (meth)acrylate is represented by general formula (1) (wherein R 1 , R 2 and R 3 may be same or different and they are each an alkyl group; R 4 is a hydrogen atom or a methyl group). The method for producing the compound comprises using a metal or a metal compound. COPYRIGHT: (C)2005,JPO&NCIPI