Invention Patent
- Patent Title: Tin based plating film in which growth of whisker is suppressed and forming method therefor
- Patent Title (中): 基于垫片生长的TIN基镀膜及其形成方法
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Application No.: JP2004183078Application Date: 2004-06-21
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Publication No.: JP2006009039APublication Date: 2006-01-12
- Inventor: KWOK CHUN WAH , KWOK YIM WAH , NAKAGISHI YUTAKA
- Applicant: Okuno Chem Ind Co Ltd , Rambo Chemicals (Hong Kong) Ltd , 奥野製薬工業株式会社 , 永保化工(香港)有限公司
- Assignee: Okuno Chem Ind Co Ltd,Rambo Chemicals (Hong Kong) Ltd,奥野製薬工業株式会社,永保化工(香港)有限公司
- Current Assignee: Okuno Chem Ind Co Ltd,Rambo Chemicals (Hong Kong) Ltd,奥野製薬工業株式会社,永保化工(香港)有限公司
- Priority: JP2004183078 2004-06-21
- Main IPC: C25D5/10
- IPC: C25D5/10 ; C23C18/16 ; C23C18/48 ; H05K3/34
Abstract:
PROBLEM TO BE SOLVED: To provide a product in which a lead-free tinning film or a lead-free tin alloy plating film is formed, and which can be produced relatively easily without need of a complicated process while the generation of whiskers is suppressed over a long period. SOLUTION: The tin based plating film in which the growth of whiskers is suppressed is composed of a plating film with a double layer structure consisting of: a lower layer formed of a tinning film or a tin alloy plating film comprising ≤5 wt.% of at least one kind of metal selected from the group consisting of cobalt, copper, bismuth, silver and indium, and ≥95 wt.% tin; and an upper layer formed of a tinning film or a tin alloy plating film comprising ≤5 wt.% of at least one kind of metal selected from the group consisting of cobalt, copper, bismuth, silver and indium, and ≥95 wt.% tin. COPYRIGHT: (C)2006,JPO&NCIPI
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