Tin based plating film in which growth of whisker is suppressed and forming method therefor
    1.
    发明专利
    Tin based plating film in which growth of whisker is suppressed and forming method therefor 审中-公开
    基于垫片生长的TIN基镀膜及其形成方法

    公开(公告)号:JP2006009039A

    公开(公告)日:2006-01-12

    申请号:JP2004183078

    申请日:2004-06-21

    Abstract: PROBLEM TO BE SOLVED: To provide a product in which a lead-free tinning film or a lead-free tin alloy plating film is formed, and which can be produced relatively easily without need of a complicated process while the generation of whiskers is suppressed over a long period. SOLUTION: The tin based plating film in which the growth of whiskers is suppressed is composed of a plating film with a double layer structure consisting of: a lower layer formed of a tinning film or a tin alloy plating film comprising ≤5 wt.% of at least one kind of metal selected from the group consisting of cobalt, copper, bismuth, silver and indium, and ≥95 wt.% tin; and an upper layer formed of a tinning film or a tin alloy plating film comprising ≤5 wt.% of at least one kind of metal selected from the group consisting of cobalt, copper, bismuth, silver and indium, and ≥95 wt.% tin. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种无铅锡镀膜或无铅锡合金镀膜形成的产品,并且可以相对容易地制造而不需要复杂的工艺而产生晶须 被长期压制。 解决方案:抑制晶须生长的锡基电镀膜由具有双层结构的镀膜构成,该镀膜由以下组成:由镀锡膜或含有≤5重量%的锡合金镀膜形成的下层 选自钴,铜,铋,银和铟中的至少一种金属和≥95重量%的锡的% 以及由含有≤5重量%的选自钴,铜,铋,银和铟中的至少一种金属的镀锡膜或锡合金镀膜形成的上层,并且≥95重量% 锡。 版权所有(C)2006,JPO&NCIPI

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