公开(公告)号：JP2015033372A

公开(公告)日：2015-02-19

申请号：JP2013167043

申请日：2013-08-09

Applicant: 学校法人明治大学 ,  Meiji Univ ,  奥野製薬工業株式会社 ,  Okuno Chem Ind Co Ltd

Inventor： MUROTA AKIHIKO ,  KATSURAYA KANAME ,  MOTO MIHOKO

IPC: A23L1/30 ,  A61K31/734 ,  A61K31/738 ,  A61P3/10

Abstract: 【課題】糖尿病の病態発現の予防に有効な食品、及び糖尿病治療薬の提供。【解決手段】コンドロイチン硫酸又はその塩の加水分解物で、質量平均分子量が25000Da以下のものを含有する糖尿病予防食品;コンドロイチン硫酸又はその塩の加水分解物で、質量平均分子量が25000Da以下のものを有効成分とする糖尿病治療薬;アルギン酸又はその塩を含有する水溶液に、加圧及び加熱条件下、二酸化炭素ガスを作用させて、前記アルギン酸又はその塩を加水分解して得られた、質量平均分子量が50000Da以下の分解物を含有する糖尿病予防食品;アルギン酸又はその塩を含有する水溶液に、加圧及び加熱条件下、二酸化炭素ガスを作用させて、前記アルギン酸又はその塩を加水分解して得られた、質量平均分子量が50000Da以下の分解物を有効成分とする糖尿病治療薬。【選択図】なし

Abstract translation: 要解决的问题：提供有效预防糖尿病病理的食品和糖尿病治疗剂。解决方案：糖尿病食品包含硫酸软骨素或其盐的水解物，其质均分子量为25,000Da以下 。 糖尿病治疗剂含有质量平均分子量为25,000Da以下的硫酸软骨素或其盐的水解物作为活性成分。 用于预防糖尿病的食品包含通过在加压/加热条件下在含有藻酸或其盐的溶液上作用二氧化碳气体并进行藻酸水解获得的质均分子量为50,000Da以下的分解产物 或其盐。 糖尿病治疗剂含有作为活性成分的质量平均分子量为50,000Da以下的分解产物，其通过在加压/加热条件下在含有藻酸或其盐的溶液上作用二氧化碳气体并进行水解 海藻酸或其盐。

公开(公告)号：JP2010252647A

公开(公告)日：2010-11-11

申请号：JP2009103856

申请日：2009-04-22

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： SUZUKI KENTA ,  WADA KIYOTAKA ,  ANDO TAMEAKI ,  TANAKA KATSUYUKI

IPC: A23L7/109 ,  A23L7/10

Abstract: PROBLEM TO BE SOLVED: To provide a quality improver for food product which prevents formation of specks in cereal flour food product. SOLUTION: The quality improver for food includes at least one kind selected from the group consisting of defatted rice bran extract and roasted rice bran extract. A method for producing cereal flour food dough is provided. The method includes a step for using at least one kind selected from the group consisting of the defatted rice bran extract and the roasted rice bran extract, and cereal flour, to produce the dough. A food cereal flour composition containing at least one kind selected from the group consisting of the defatted rice bran extract and the roasted rice bran extract, and the cereal flour, is also provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供防止谷物粉产品中斑点形成的食品质量改进剂。

解决方案：食品质量改进剂包括从脱脂米糠提取物和烤米糠提取物中选出的至少一种。 提供了一种生产谷物粉食品面团的方法。 该方法包括使用从由脱脂米糠提取物和烤米糠提取物组成的组中选出的至少一种的谷物粉和谷物粉来制造面团的步骤。 还提供了含有选自脱脂米糠提取物和烤米糠提取物中的至少一种的谷物粉组合物和麦粉。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010248545A

公开(公告)日：2010-11-04

申请号：JP2009096784

申请日：2009-04-13

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： TAKAICHI HIDETOSHI

IPC: C25D11/18

Abstract: PROBLEM TO BE SOLVED: To provide a sealing method by which an anodized film of dyed aluminum alloy can be converted to a film excellent in dye fixation and corrosion resistance without using a nickel salt.
SOLUTION: In the sealing method for the anodized film of the aluminum alloy, the anodic oxide film of the dyed aluminum alloy is immersed in a water-soluble cation polymer aqueous solution and then is immersed in a sealing solution containing a sealant consisting of a magnesium salt and/or a calcium salt to perform sealing.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种密封方法，通过该方法，可以将染色的铝合金的阳极氧化膜转化为在不使用镍盐的情况下，染料固着和耐腐蚀性优异的膜。 解决方案：在铝合金阳极氧化膜的密封方法中，将染色的铝合金的阳极氧化膜浸入水溶性阳离子聚合物水溶液中，然后浸入含有密封剂的密封溶液中 的镁盐和/或钙盐进行密封。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010121194A

公开(公告)日：2010-06-03

申请号：JP2008298201

申请日：2008-11-21

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： HORIKAWA MAKOTO ,  TAKAHASHI CHIE ,  YAMATO SHIGERU

IPC: C25D3/02 ,  C25D3/12 ,  C25D3/38

Abstract: PROBLEM TO BE SOLVED: To provide a method of forming a homogeneous and excellent porous coating film by carrying out an inexpensive process applied to various base materials without using a specific apparatus. SOLUTION: The additive for an electroplating bath for forming the porous plating film comprises a water soluble quaternary ammonium compound having hydrophobic group. The method of forming the porous plating film is carried out by electroplating in the electroplating bath containing the additive. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 待解决的问题：提供一种通过在不使用特定装置的情况下执行应用于各种基材的廉价的方法来形成均匀且优异的多孔涂膜的方法。 解决方案：用于形成多孔镀膜的电镀浴用添加剂包括具有疏水性基团的水溶性季铵化合物。 形成多孔镀膜的方法通过电镀在含有添加剂的电镀浴中进行。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010059479A

公开(公告)日：2010-03-18

申请号：JP2008226257

申请日：2008-09-03

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： KUDO KIMIKO ,  SHIMOJI TERUAKI ,  MATSUNAMI TAKUJI ,  NAWAFUNE HIDEMI

IPC: C23C18/18 ,  H05K3/18 ,  H05K3/24

Abstract: PROBLEM TO BE SOLVED: To provide a new pretreatment agent for electroless plating, which enables an adequate electroless-plated film of palladium or electroless-plated film of gold to be directly formed on a material such as copper, silver and an alloy thereof. SOLUTION: The activating liquid for electroless plating is an aqueous solution including (i) a water-soluble palladium compound; (ii) at least one halide selected from the group consisting of a hydrohalic acid, a metal halide and an ammonium halide; and (iii) at least one nitrogen-atom-containing compound selected from the group consisting of an alkylenediamine, a polyalkylenepolyamine, a polyamidepolyamine, and a crosslinked product of a polyamidepolyamine. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种用于化学镀的新型预处理剂，其使得能够在诸如铜，银和合金的材料上直接形成钯或金的无电镀金膜的足够的化学镀膜 它们。 解决方案：化学镀的活化液是水溶液，包括（i）水溶性钯化合物; （ii）选自氢卤酸，金属卤化物和卤化铵的至少一种卤化物; 和（iii）至少一种选自亚烷基二胺，聚亚烷基多胺，聚酰胺聚胺和聚酰胺聚胺的交联产物的含氮原子的化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009235456A

公开(公告)日：2009-10-15

申请号：JP2008080755

申请日：2008-03-26

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： KATAYAMA JUNICHI ,  NAGAMINE SHINGO ,  NAKAMURA KANAME

IPC: C25D3/06 ,  C25D5/12

Abstract: PROBLEM TO BE SOLVED: To provide a solution for use in treating a trivalent-chromium plated film, which can greatly improve a corrosion resistance of the trivalent-chromium plated film without using a hexavalent chromium compound, and to provide a treatment method therefor.
SOLUTION: The solution for use in electrolytically treating the trivalent-chromium plated film is formed of an aqueous solution containing a water-soluble trivalent chromium compound. The method for electrolytically treating the trivalent-chromium plated film includes cathodically electrolyzing an article which has the trivalent-chromium plated film thereon, in the electrolytic treatment solution.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于处理三价铬电镀膜的方法，其可以在不使用六价铬化合物的情况下大大提高三价铬镀膜的耐腐蚀性，并提供一种处理方法 因此。 解决方案：用于电解处理三价铬镀膜的溶液由含有水溶性三价铬化合物的水溶液形成。 用于电解处理三价铬镀膜的方法包括在电解处理溶液中阴极电解其上具有三价铬镀膜的制品。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009144227A

公开(公告)日：2009-07-02

申请号：JP2007325704

申请日：2007-12-18

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： KITA KOJI ,  MURATA TOSHIYA ,  IMAMURA MAKOTO

IPC: C23C18/24

Abstract: PROBLEM TO BE SOLVED: To provide a new treatment agent, in a plating treatment method including an etching step with a chromic acid-sulfuric acid mixed liquid, which has a stable neutralization action to the chromic acid comprised in the etching treatment liquid, and also can exhibit excellent catalyst sticking capacity to various resin moldings. SOLUTION: The post-treatment agent for etching treatment with a chromium acid-sulfuric acid mixed liquid is composed of an aqueous solution comprising a diamine compound or a condensation polymer of the diamine compound and epichlorhydrin as an effective component(s). In the plating method to a resin molding, a resin molding is subjected to etching treatment using a chromic acid-sulfuric acid mixed liquid, thereafter, the resin molding is brought into contact with the above post-treatment agent, subsequently, catalyst application and electroless plating are performed, and further, electroplating is performed as necessary. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 待解决的问题：为了提供新的处理剂，在包括对铬酸 - 硫酸混合液的蚀刻步骤的电镀处理方法中，其对腐蚀处理液中包含的铬酸具有稳定的中和作用 ，并且还可以对各种树脂模制品显示出优异的催化剂粘附能力。 解决方案：用铬酸 - 硫酸混合液进行蚀刻处理的后处理剂由包含二胺化合物或二胺化合物和表氯醇作为有效成分的缩聚物的水溶液组成。 在树脂成形体的电镀法中，使用铬酸 - 硫酸混合液对树脂成型体进行蚀刻处理，然后使树脂成型体与上述后处理剂接触，随后进行催化剂施加和无电解 进行电镀，进一步根据需要进行电镀。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009035806A

公开(公告)日：2009-02-19

申请号：JP2007242472

申请日：2007-09-19

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： KATAYAMA JUNICHI ,  NAGAMINE SHINGO

IPC: C25D3/06

Abstract: PROBLEM TO BE SOLVED: To provide a trivalent chromium plating bath by which a plated film having a smooth surface, high corrosion resistance and satisfactory wear resistance is obtained with high productivity. SOLUTION: The trivalent chromium plating bath contains following components (1)-(4), that are, (1) a trivalent chromium complex solution obtained by holding at least one kind of component selected from aqueous aliphatic carboxylic acids and the salts and an aqueous solution containing a trivalent chromium compound under heating , (2) a conductive salt, (3) a pH buffer agent and (4) at least one sulfur-containing compound selected from a group comprising compounds having SO 2 group and compounds having SO 3 group. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种三价铬电镀浴，通过该镀浴，可以以高生产率获得具有光滑表面，高耐腐蚀性和令人满意的耐磨性的镀膜。 解决方案：三价镀铬浴含有以下组分（1） - （4），即（1）通过保持至少一种选自脂族羧酸水溶液和盐的组分获得的三价铬络合物溶液 和加热时含有三价铬化合物的水溶液，（2）导电盐，（3）pH缓冲剂和（4）至少一种选自SO 2 S 2的化合物的含硫化合物， / SB>基团和具有SO 3 基团的化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009022948A

公开(公告)日：2009-02-05

申请号：JP2008105547

申请日：2008-04-15

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： MORIMOTO TORU ,  YOSHIKAWA JUNJI ,  NAGAO TOSHIMITSU ,  YOSHIKANE YUSUKE ,  MURATA TOSHIYA

IPC: C02F1/461 ,  C23C18/16

Abstract: PROBLEM TO BE SOLVED: To provide a method by which used etching liquid, which is generated by using a new etching liquid containing manganese salt and in which a halogen acid and/or its salt are accumulated, is electrolyzed to decrease the concentration of the halogen acid and/or its salt so that the electrolyzed etching liquid can be used continuously for a long time.
SOLUTION: The etching liquid consists of an aqueous solution containing 20-1,200 g/L inorganic acid, 0.01-40 g/L manganese salt and 1-200 g/L at least one component selected from the group consisting of a perhalogen acid and its salt. In the method of electrolyzing etching liquid, used etching liquid, in which the concentration of the halogen acid or its salt is increased, is electrolyzed, namely, oxidized anodically.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种方法，通过使用通过使用含有锰盐并且其中含有卤素和/或其盐的积累的新的蚀刻液产生的使用的蚀刻液被电解以降低浓度 的卤酸和/或其盐，使得电解蚀刻液可以长时间连续使用。 解决方案：蚀刻液由含有20-1200g / L无机酸，0.01-40g / L锰盐和1-200g / L至少一种选自以下的组分的水溶液组成： 酸及其盐。 在电解蚀刻液的方法中，电解使卤素酸或其盐的浓度增加的所使用的蚀刻液，即阳极氧化。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008179575A

公开(公告)日：2008-08-07

申请号：JP2007015587

申请日：2007-01-25

Applicant: Okuno Chem Ind Co Ltd ,  奥野製薬工業株式会社

Inventor： ICHIOKA NORITAKA ,  INOUE AYAKA

IPC: A01N43/78 ,  A01N25/22 ,  A01P3/00 ,  A23L3/3472 ,  A23L3/3544

Abstract: PROBLEM TO BE SOLVED: To provide a thiamine lauryl sulfate-containing powder preparation enabling thiamine lauryl sulfate to be stably dissolved in a liquid food such as a common salt-rich liquid seasoning.
SOLUTION: The powder preparation comprises thiamine lauryl sulfate and tangle extract, wherein the tangle extract is prepared by subjecting tangle to the extraction with ethanol or a hydrous ethanol. In this preparation, the tangle extract is contained at 3 pts.mass or more, on a dry basis, per 1 pt.mass of the thiamine lauryl sulfate. When this powder preparation is added to an aqueous solution containing 3 mass% of common salt so as to be 100 ppm in thiamine lauryl sulfate concentration and the resultant solution is left to stand at 4°C for 48 h, no precipitation occurs.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 待解决的问题：提供使十二烷基硫酸十二烷基硫酸钠稳定地溶解在液体食品如富含盐的液体调味料中的含硫代十二烷基硫酸盐的粉末制剂。 解决方案：粉末制剂包括十二烷基硫酸硫酸钠和缠结提取物，其中缠结提取物通过用乙醇或含水乙醇进行缠结来制备。 在该制剂中，缠绕提取物以每1磅硫代十二烷基硫酸硫酸钠为基准，以干燥的方式包含在3磅或更多。 当将该粉末制剂加入到含有3质量％的盐的水溶液中，以十二烷基硫酸硫酸钠浓度为100ppm时，将所得溶液在4℃下放置48小时，不会发生沉淀。 版权所有（C）2008，JPO＆INPIT