Invention Grant
- Patent Title: Inspection device
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Application No.: US15667040Application Date: 2017-08-02
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Publication No.: US10002740B2Publication Date: 2018-06-19
- Inventor: Masahiro Hatakeyama , Ryo Tajima , Kenichi Suematsu , Kenji Watanabe , Yasushi Toma , Kenji Terao , Takeshi Murakami
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2015-021169 20150205; JP2016-003745 20160112; JP2016-014182 20160128
- Main IPC: H01J37/05
- IPC: H01J37/05 ; H01J37/147 ; H01J37/141 ; H01J37/26 ; H01J37/244

Abstract:
An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.
Public/Granted literature
- US20180040452A1 INSPECTION DEVICE Public/Granted day:2018-02-08
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