Invention Grant
- Patent Title: Chemistry compatible coating material for advanced device on-wafer particle performance
-
Application No.: US15084299Application Date: 2016-03-29
-
Publication No.: US10020170B2Publication Date: 2018-07-10
- Inventor: Jennifer Y. Sun , Biraja P. Kanungo , Dmitry Lubomirsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C23C4/10
- IPC: C23C4/10 ; H01J37/32 ; H01L21/02 ; C04B41/87 ; C04B41/00 ; C04B41/50 ; C23C4/11 ; C23C4/134 ; H01L21/67
Abstract:
A method includes feeding powder comprising a yttrium oxide into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating an article to apply a ceramic coating onto the article, wherein the ceramic coating comprises the yttrium oxide, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.
Public/Granted literature
- US20160211121A1 CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE Public/Granted day:2016-07-21
Information query
IPC分类:
