- 专利标题： Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus
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申请号： US14736582申请日： 2015-06-11
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公开(公告)号： US10035173B2公开(公告)日： 2018-07-31
- 发明人: Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
- 申请人： TOKYO ELECTRON LIMITED
- 申请人地址： JP Minato-Ku
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Minato-Ku
- 代理机构： Burr & Brown, PLLC
- 优先权： JP2010-106656 20100506
- 主分类号： B05D1/02
- IPC分类号： B05D1/02 ; H01L21/67 ; F17D1/00 ; B01D29/56 ; B01D35/02 ; B05C11/10 ; B05C9/06
摘要：
A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
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