Invention Grant
- Patent Title: Apparatus and method of traversing acceleration structure in ray tracing system
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Application No.: US14722887Application Date: 2015-05-27
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Publication No.: US10049488B2Publication Date: 2018-08-14
- Inventor: Jaedon Lee , Youngsam Shin , Wonjong Lee , Seokjoong Hwang
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2014-0063725 20140527
- Main IPC: G06T15/06
- IPC: G06T15/06

Abstract:
A method of traversing an acceleration structure (AS) in a ray tracing system includes obtaining information about child nodes of a target node included in the AS; determining whether each of the child nodes intersects a ray based on the obtained information; determining a next target node among at least one child node that intersects the ray; and performing an operation corresponding to a type of the determined next target node.
Public/Granted literature
- US20150348308A1 APPARATUS AND METHOD OF TRAVERSING ACCELERATION STRUCTURE IN RAY TRACING SYSTEM Public/Granted day:2015-12-03
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T15/00 | 3D〔三维〕图像的加工 |
G06T15/06 | .光线跟踪 |