- 专利标题: Fluid monitoring system and method for semiconductor fabrication tools
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申请号: US14976944申请日: 2015-12-21
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公开(公告)号: US10056276B2公开(公告)日: 2018-08-21
- 发明人: Chris Lary
- 申请人: WaferTech, LLC
- 申请人地址: US WA Camas
- 专利权人: WAFERTECH, LLC
- 当前专利权人: WAFERTECH, LLC
- 当前专利权人地址: US WA Camas
- 代理机构: Duane Morris LLP
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; C23C16/00 ; G01M1/00
摘要:
A system and method provide for monitoring and controlling fluid flow in semiconductor manufacturing apparatuses. The method and system include a vortex flow meter coupled to a digital readout that displays the measured flow rate and trip point. The flow meter display includes input devices used to adjust the trip point. The system and method provide for sending signals via a custom relay to the semiconductor manufacturing apparatus which is adapted to terminate a processing operation or change the fluid flow if the trip point is tripped. The system and method also provide for sending an electrical signal to a computer by way of a data acquisition unit and a converter. The converter converts the signal to a communication protocol consistent with the computer network and provides fluid flow information and trip point data as a function of time to the computer which then displays such data graphically.
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