Invention Grant
- Patent Title: Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation
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Application No.: US14964033Application Date: 2015-12-09
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Publication No.: US10073351B2Publication Date: 2018-09-11
- Inventor: Rajiv Krishan Agarwal , Mark Richard Brown , Aiping Wu , David Barry Rennie , Yi-Chia Lee , Gene Everad Parris
- Applicant: AIR PRODUCTS AND CHEMICALS, INC.
- Applicant Address: US AZ Tempe
- Assignee: VERSUM MATERIALS US, LLC
- Current Assignee: VERSUM MATERIALS US, LLC
- Current Assignee Address: US AZ Tempe
- Agent Anne B. Kiernan
- Main IPC: C11D7/32
- IPC: C11D7/32 ; G03F7/42 ; C11D11/00 ; C11D7/26 ; H01L21/02
Abstract:
A photoresist or semiconductor manufacturing residue stripping and cleaning composition comprising water, one or more alkaline compounds, one or more corrosion inhibitors, and one or more oxidized products of one or more antioxidants, the method of making the composition and the method of using the composition.
Public/Granted literature
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