Invention Grant
- Patent Title: Antenna and plasma processing apparatus
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Application No.: US14675873Application Date: 2015-04-01
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Publication No.: US10083819B2Publication Date: 2018-09-25
- Inventor: Naoki Matsumoto , Koji Koyama , Jun Yoshikawa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2012-221383 20121003
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01J37/32 ; C23C16/511 ; H05H1/46 ; H01Q13/10 ; H01Q21/06 ; H01Q21/20 ; H01L21/3213
Abstract:
An antenna includes a dielectric window and a slot plate provided at one surface of the dielectric window. The slot plate includes a plurality of slot pairs each being formed of two slots. The slot pairs are concentrically disposed about a centroid position of the slot plate and provided at positions where straight lines extending from the centroid position of the slot plate and passing through each slot pair are not overlapped with each other.
Public/Granted literature
- US20150206712A1 ANTENNA AND PLASMA PROCESSING APPARATUS Public/Granted day:2015-07-23
Information query
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