Invention Grant
- Patent Title: Crystal orientation layer laminated structure, electronic memory and method for manufacturing crystal orientation layer laminated structure
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Application No.: US15349074Application Date: 2016-11-11
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Publication No.: US10090460B2Publication Date: 2018-10-02
- Inventor: Yuta Saito , Junji Tominaga , Reiko Kondo
- Applicant: National Institute of Advanced Industrial Science and Technology
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science & Technology
- Current Assignee: National Institute of Advanced Industrial Science & Technology
- Current Assignee Address: JP Tokyo
- Agency: McCormick, Paulding & Huber LLP
- Priority: JP2014-098415 20140512
- Main IPC: H01L29/49
- IPC: H01L29/49 ; H01L45/00 ; H01L27/105 ; H01L29/82 ; C23C14/34 ; C30B23/02 ; C30B29/46 ; C30B29/68 ; G11C11/16

Abstract:
A crystal orientation layer laminated structure capable of widely selecting materials for a base substrate and an electrode substrate, an electronic memory using the crystal orientation layer laminated structure and a method for manufacturing the crystal orientation layer laminated structure are provided. The crystal orientation layer laminated structure according to the present invention has such a feature as including a substrate, including an orientation control layer which is laminated on the substrate, which is made of any of germanium, silicon, tungsten, germanium-silicon, germanium-tungsten and silicon-tungsten, and whose thickness is at least 1 nm or more, and including a first crystal orientation layer which is laminated on the orientation control layer, which is made of any of SbTe, Sb2Te3, BiTe, Bi2Te3, BiSe and Bi2Se3 as a main component, and which is oriented in a certain crystal orientation.
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