- 专利标题: Soundproof structure and soundproof structure manufacturing method
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申请号: US15679650申请日: 2017-08-17
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公开(公告)号: US10099317B2公开(公告)日: 2018-10-16
- 发明人: Shinya Hakuta , Shogo Yamazoe , Tatsuya Yoshihiro , Akihiko Ohtsu , Tadashi Kasamatsu , Masayuki Naya
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2015-039513 20150227; JP2015-121994 20150617
- 主分类号: E04B1/86
- IPC分类号: E04B1/86 ; B23K26/382 ; G10K11/16 ; B23K26/00 ; G10K11/162
摘要:
A soundproof structure has one or more soundproof cells. Each of the one or more soundproof cells includes a frame having a through-hole, a film fixed to the frame, and an opening portion configured to include one or more holes drilled in the film. Neither end portions of the through-hole of the frame are closed. The soundproof structure has a shielding peak frequency, which is determined by the opening portion of each of the one or more soundproof cells and at which a transmission loss is maximized, on a lower frequency side than a first natural vibration frequency of the film of each of the one or more soundproof cells, and selectively insulates sound in a predetermined frequency band including the shielding peak frequency at its center. Accordingly, there is provided a soundproof structure that is light and thin, does not depend on the position and shape of a hole, has high robustness as a sound insulation material, is stable, has air permeability, has no heat, and is excellent in manufacturability, and a soundproof structure manufacturing method.