- Patent Title: Soundproof structure and soundproof structure manufacturing method
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Application No.: US15679650Application Date: 2017-08-17
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Publication No.: US10099317B2Publication Date: 2018-10-16
- Inventor: Shinya Hakuta , Shogo Yamazoe , Tatsuya Yoshihiro , Akihiko Ohtsu , Tadashi Kasamatsu , Masayuki Naya
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-039513 20150227; JP2015-121994 20150617
- Main IPC: E04B1/86
- IPC: E04B1/86 ; B23K26/382 ; G10K11/16 ; B23K26/00 ; G10K11/162

Abstract:
A soundproof structure has one or more soundproof cells. Each of the one or more soundproof cells includes a frame having a through-hole, a film fixed to the frame, and an opening portion configured to include one or more holes drilled in the film. Neither end portions of the through-hole of the frame are closed. The soundproof structure has a shielding peak frequency, which is determined by the opening portion of each of the one or more soundproof cells and at which a transmission loss is maximized, on a lower frequency side than a first natural vibration frequency of the film of each of the one or more soundproof cells, and selectively insulates sound in a predetermined frequency band including the shielding peak frequency at its center. Accordingly, there is provided a soundproof structure that is light and thin, does not depend on the position and shape of a hole, has high robustness as a sound insulation material, is stable, has air permeability, has no heat, and is excellent in manufacturability, and a soundproof structure manufacturing method.
Public/Granted literature
- US20170341186A1 SOUNDPROOF STRUCTURE AND SOUNDPROOF STRUCTURE MANUFACTURING METHOD Public/Granted day:2017-11-30
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